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Results: 1-19 |
Results: 19
STRUCTURAL CHARACTERIZATION OF ULTRATHIN NANOCRYSTALLINE SILICON FILMS FORMED BY ANNEALING AMORPHOUS-SILICON
Authors: LUTZEN J KAMAL AHM KOZICKI MN FERRY DK SIDOROV MV SMITH DJ
Citation: J. Lutzen et al., STRUCTURAL CHARACTERIZATION OF ULTRATHIN NANOCRYSTALLINE SILICON FILMS FORMED BY ANNEALING AMORPHOUS-SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2802-2805
ANALYSIS OF KOH ETCHING OF (100)-SILICON-ON-INSULATOR FOR THE FABRICATION OF NANOSCALE TIPS
Authors: YUN MH BURROWS VA KOZICKI MN
Citation: Mh. Yun et al., ANALYSIS OF KOH ETCHING OF (100)-SILICON-ON-INSULATOR FOR THE FABRICATION OF NANOSCALE TIPS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2844-2848
APPLICATION OF CHEMICALLY ENHANCED VAPOR ETCHING IN THE FABRICATION ON NANOSTRUCTURES
Authors: KOZICKI MN KARDYNAL B YANG SJ KIM T SIDOROV MV SMITH DJ
Citation: Mn. Kozicki et al., APPLICATION OF CHEMICALLY ENHANCED VAPOR ETCHING IN THE FABRICATION ON NANOSTRUCTURES, Semiconductor science and technology, 13(8A), 1998, pp. 63-66
A 2-TERMINAL NANOCRYSTALLINE SILICON MEMORY DEVICE AT ROOM-TEMPERATURE
Authors: KAMAL AHM LUTZEN J SANBORN BA SIDOROV MV KOZICKI MN SMITH DJ FERRY DK
Citation: Ahm. Kamal et al., A 2-TERMINAL NANOCRYSTALLINE SILICON MEMORY DEVICE AT ROOM-TEMPERATURE, Semiconductor science and technology (Print), 13(11), 1998, pp. 1328-1332
EQUIVALENT-CIRCUIT MODELING OF THE AG-VERTICAL-BAR-AS0.24S0.36AG0.40-VERTICAL-BAR-AG SYSTEM PREPARED BY PHOTODISSOLUTION OF AG
Authors: WEST WC SIERADZKI K KARDYNAL B KOZICKI MN
Citation: Wc. West et al., EQUIVALENT-CIRCUIT MODELING OF THE AG-VERTICAL-BAR-AS0.24S0.36AG0.40-VERTICAL-BAR-AG SYSTEM PREPARED BY PHOTODISSOLUTION OF AG, Journal of the Electrochemical Society, 145(9), 1998, pp. 2971-2974
ULTRATHIN COBALT SILICIDE LAYERS FORMED BY RAPID THERMAL-PROCESSING OF METAL ON AMORPHOUS-SILICON
Authors: KAMAL AHM RACK MJ KOZICKI MN FERRY DK LUTZEN J HALLMARK JA
Citation: Ahm. Kamal et al., ULTRATHIN COBALT SILICIDE LAYERS FORMED BY RAPID THERMAL-PROCESSING OF METAL ON AMORPHOUS-SILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 899-902
ELECTRICAL CHARACTERIZATION OF UROMYCES GERM TUBES GROWN ON INTEGRATED-CIRCUIT SUBSTRATES
Authors: MCNALLY HA KOZICKI MN ROBERSON RW WHIDDEN TK
Citation: Ha. Mcnally et al., ELECTRICAL CHARACTERIZATION OF UROMYCES GERM TUBES GROWN ON INTEGRATED-CIRCUIT SUBSTRATES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 779-783
NANOSCALE LITHOGRAPHY OF SILICON DIOXIDE USING ELECTRON-BEAM PATTERNED CARBOXYLIC-ACIDS AS LOCALIZED ETCH INITIATORS
Authors: WHIDDEN TK YANG SJ JENKINSGRAY A PAN M KOZICKI MN
Citation: Tk. Whidden et al., NANOSCALE LITHOGRAPHY OF SILICON DIOXIDE USING ELECTRON-BEAM PATTERNED CARBOXYLIC-ACIDS AS LOCALIZED ETCH INITIATORS, Journal of the Electrochemical Society, 144(2), 1997, pp. 605-616
NANOSCALE PATTERNING OF SILICON DIOXIDE THIN-FILMS BY CATALYZED HF VAPOR ETCHING
Authors: ALLGAIR J RYAN JM SONG HJ KOZICKI MN WHIDDEN TK FERRY DK
Citation: J. Allgair et al., NANOSCALE PATTERNING OF SILICON DIOXIDE THIN-FILMS BY CATALYZED HF VAPOR ETCHING, Nanotechnology, 7(4), 1996, pp. 351-355
PATTERN TRANSFER TO SILICON BY MICROCONTACT PRINTING AND RIE
Authors: WHIDDEN TK FERRY DK KOZICKI MN KIM E KUMAR A WILBUR J WHITESIDES GM
Citation: Tk. Whidden et al., PATTERN TRANSFER TO SILICON BY MICROCONTACT PRINTING AND RIE, Nanotechnology, 7(4), 1996, pp. 447-451
THE USE OF ELECTRON-BEAM EXPOSURE AND CHEMICALLY ENHANCED VAPOR ETCHING OF SIO2 FOR NANOSCALE FABRICATION
Authors: KOZICKI MN ALLGAIR J JENKINSGRAY A FERRY DK WHIDDEN TK
Citation: Mn. Kozicki et al., THE USE OF ELECTRON-BEAM EXPOSURE AND CHEMICALLY ENHANCED VAPOR ETCHING OF SIO2 FOR NANOSCALE FABRICATION, Physica. B, Condensed matter, 227(1-4), 1996, pp. 318-322
SELF-ASSEMBLED MONOLAYER RESISTS AND NANOSCALE LITHOGRAPHY OF SILICONDIOXIDE THIN-FILMS BY CHEMICALLY ENHANCED VAPOR ETCHING (CEVE)
Authors: PAN M YUN M KOZICKI MN WHIDDEN TK
Citation: M. Pan et al., SELF-ASSEMBLED MONOLAYER RESISTS AND NANOSCALE LITHOGRAPHY OF SILICONDIOXIDE THIN-FILMS BY CHEMICALLY ENHANCED VAPOR ETCHING (CEVE), Superlattices and microstructures, 20(3), 1996, pp. 369-376
FORMATION OF NANOSCALE COBALT SILICIDE AND GOLD WIRES USING ELECTRON-BEAM AND CHEMICALLY ENHANCED VAPOR ETCHING
Authors: ALLGAIR J RACK MJ WHIDDEN TK KOZICKI MN FERRY DK
Citation: J. Allgair et al., FORMATION OF NANOSCALE COBALT SILICIDE AND GOLD WIRES USING ELECTRON-BEAM AND CHEMICALLY ENHANCED VAPOR ETCHING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1855-1859
NANOLITHOGRAPHY
Authors: FERRY DK KHOURY M PIVIN DP CONNOLLY KM WHIDDEN TK KOZICKI MN ALLEE DR
Citation: Dk. Ferry et al., NANOLITHOGRAPHY, Semiconductor science and technology, 11(11), 1996, pp. 1552-1557
NANOSCALE LITHOGRAPHY WITH ELECTRON EXPOSURE OF SIO2 RESISTS
Authors: WHIDDEN TK ALLGAIR J JENKINSGRAY A KHOURY M KOZICKI MN FERRY DK
Citation: Tk. Whidden et al., NANOSCALE LITHOGRAPHY WITH ELECTRON EXPOSURE OF SIO2 RESISTS, JPN J A P 1, 34(8B), 1995, pp. 4420-4425
NANOSCALE SCANNING TUNNELING MICROSCOPE PATTERNING OF SILICON DIOXIDETHIN-FILMS BY CATALYZED HF VAPOR ETCHING
Authors: WHIDDEN TK ALLGAIR J JENKINSGRAY A KOZICKI MN
Citation: Tk. Whidden et al., NANOSCALE SCANNING TUNNELING MICROSCOPE PATTERNING OF SILICON DIOXIDETHIN-FILMS BY CATALYZED HF VAPOR ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 1337-1341
DIRECTED GROWTH OF UROMYCES-HYPHAE ON INTEGRATED-CIRCUIT SUBSTRATES
Authors: KOZICKI MN ROBERSON RW WHIDDEN TK KERSEY SE
Citation: Mn. Kozicki et al., DIRECTED GROWTH OF UROMYCES-HYPHAE ON INTEGRATED-CIRCUIT SUBSTRATES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 1808-1813
CATALYZED HF VAPOR ETCHING OF SILICON DIOXIDE FOR MICROLITHOGRAPHIC AND NANOLITHOGRAPHIC MASKS
Authors: WHIDDEN TK ALLGAIR J RYAN JM KOZICKI MN FERRY DK
Citation: Tk. Whidden et al., CATALYZED HF VAPOR ETCHING OF SILICON DIOXIDE FOR MICROLITHOGRAPHIC AND NANOLITHOGRAPHIC MASKS, Journal of the Electrochemical Society, 142(4), 1995, pp. 1199-1205
EXPRO - AN EXPERT-SYSTEM BASED PROCESS MANAGEMENT-SYSTEM
Authors: RASTOGI P KOZICKI MN GOLSHANI F
Citation: P. Rastogi et al., EXPRO - AN EXPERT-SYSTEM BASED PROCESS MANAGEMENT-SYSTEM, IEEE transactions on semiconductor manufacturing, 6(3), 1993, pp. 207-218
Risultati: 1-19 |