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Results: 1-25 | 26-32 |
Results: 26-32/32
ENERGY-TRANSFER FROM RADIO-FREQUENCY SHEATH ACCELERATED CF(3)(+) AND AR(+) IONS TO A SI WAFER
Authors: KERSTEN H SNIJKERS RJMM SCHULZE J KROESEN GMW DEUTSCH H DEHOOG FJ
Citation: H. Kersten et al., ENERGY-TRANSFER FROM RADIO-FREQUENCY SHEATH ACCELERATED CF(3)(+) AND AR(+) IONS TO A SI WAFER, Applied physics letters, 64(12), 1994, pp. 1496-1498
IN-SITU DIAGNOSTICS FOR PLASMA SURFACE PROCESSING
Authors: KROESEN GMW DEHOOG FJ
Citation: Gmw. Kroesen et Fj. Dehoog, IN-SITU DIAGNOSTICS FOR PLASMA SURFACE PROCESSING, Applied physics. A, Solids and surfaces, 56(6), 1993, pp. 479-492
SPECTROSCOPIC IR ELLIPSOMETRY WITH IMPERFECT COMPONENTS
Authors: DENBOER JHWG KROESEN GMW HAVERLAG M DEHOOG FJ
Citation: Jhwg. Denboer et al., SPECTROSCOPIC IR ELLIPSOMETRY WITH IMPERFECT COMPONENTS, Thin solid films, 234(1-2), 1993, pp. 323-326
DETECTION OF PARTICULATES IN A RF PLASMA BY LASER EVAPORATION AND SUBSEQUENT DISCHARGE FORMATION
Authors: STOFFELS WW STOFFELS E KROESEN GMW DEHOOG FJ
Citation: Ww. Stoffels et al., DETECTION OF PARTICULATES IN A RF PLASMA BY LASER EVAPORATION AND SUBSEQUENT DISCHARGE FORMATION, Journal of applied physics, 74(4), 1993, pp. 2959-2961
DEPTH PROFILING OF THE GE CONCENTRATION IN SIGE ALLOYS USING INSITU ELLIPSOMETRY DURING REACTIVE-ION ETCHING
Authors: KROESEN GMW OEHRLEIN GS DEFRESART E HAVERLAG M
Citation: Gmw. Kroesen et al., DEPTH PROFILING OF THE GE CONCENTRATION IN SIGE ALLOYS USING INSITU ELLIPSOMETRY DURING REACTIVE-ION ETCHING, Journal of applied physics, 73(12), 1993, pp. 8017-8026
HIGH-RESOLUTION DEPTH PROFILING OF ULTRATHIN SILICON-OXIDE NITRIDE OXIDE LAYERS
Authors: ZHANG Y OEHRLEIN GS KROESEN GMW WITTMER M STEIN K
Citation: Y. Zhang et al., HIGH-RESOLUTION DEPTH PROFILING OF ULTRATHIN SILICON-OXIDE NITRIDE OXIDE LAYERS, Journal of the Electrochemical Society, 140(5), 1993, pp. 1439-1441
MASS-RESOLVED ION ENERGY MEASUREMENTS AT THE GROUNDED ELECTRODE OF ANARGON RF PLASMA
Authors: SNIJKERS RJMM VANSAMBEEK MJM KROESEN GMW DEHOOG FJ
Citation: Rjmm. Snijkers et al., MASS-RESOLVED ION ENERGY MEASUREMENTS AT THE GROUNDED ELECTRODE OF ANARGON RF PLASMA, Applied physics letters, 63(3), 1993, pp. 308-310
Risultati: 1-25 | 26-32 |