Authors:
TORII K
KAWAKAMI H
MIKI H
KUSHIDA K
ITOGA T
GOTO Y
KUMIHASHI T
YOKOYAMA N
MONIWA M
SHOJI K
KAGA T
FUJISAKI Y
Citation: K. Torii et al., PROCESS AND PROPERTIES OF PT PB(ZR,TI)O-3/PT INTEGRATED FERROELECTRICCAPACITORS/, Integrated ferroelectrics, 16(1-4), 1997, pp. 21-28
Citation: N. Kofuji et al., REDUCTION IN MICROLOADING BY HIGH-GAS-FLOW-RATE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING, JPN J A P 1, 34(5A), 1995, pp. 2489-2494
Citation: M. Izawa et T. Kumihashi, SURFACE MIGRATION AS A DETERMINATE FACTOR OF THE STICKING COEFFICIENTDERIVED FROM THE CHEMISORPTION MODEL, The Journal of chemical physics, 103(21), 1995, pp. 9418-9425
Citation: K. Tsujimoto et al., SHORT-GAS-RESIDENCE-TIME ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1209-1215