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Ham, UD
Kahng, SJ
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Hata, K
Shigekawa, H
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Choi, YJ
Jeong, IC
Park, JY
Kahng, SJ
Lee, J
Kuk, Y
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Hasegawa, Y
Akiyama, K
Ono, M
Kahng, SJ
Xue, QK
Nakayama, K
Hashizume, T
Sakurai, T
Citation: Y. Hasegawa et al., Erasable nanometer-scale modification at the Au/Si interface by ballistic electron emission microscopy, APPL PHYS L, 75(23), 1999, pp. 3668-3670