Authors:
Kalyanaraman, R
Haynes, TE
Yoon, M
Larson, BC
Jacobson, DC
Gossmann, HJ
Rafferty, CS
Citation: R. Kalyanaraman et al., Quantitative evolution of vacancy-type defects in high-energy ion-implanted Si: Au labeling and the vacancy implanter, NUCL INST B, 175, 2001, pp. 182-186
Authors:
Kalyanaraman, R
Haynes, TE
Holland, OW
Gossmann, HJL
Rafferty, CS
Gilmer, GH
Citation: R. Kalyanaraman et al., Binding energy of vacancies to clusters formed in Si by high-energy ion implantation, APPL PHYS L, 79(13), 2001, pp. 1983-1985
Authors:
Windt, DL
Christensen, FE
Craig, WW
Hailey, C
Harrison, FA
Jimenez-Garate, M
Kalyanaraman, R
Mao, PH
Citation: Dl. Windt et al., Growth, structure, and performance of depth-graded W/Si multilayers for hard x-ray optics, J APPL PHYS, 88(1), 2000, pp. 460-470
Authors:
Venezia, VC
Brown, RA
Kalyanaraman, R
Haynes, TE
Holland, OW
Williams, JS
Citation: Vc. Venezia et al., Comment on "Interstitial-type defects away from the projected ion range inhigh energy ion implanted and annealed silicon" [Appl. Phys. Lett. 75, 1279 (1999)], APPL PHYS L, 77(1), 2000, pp. 151-152
Authors:
Kalyanaraman, R
Haynes, TE
Venezia, VC
Jacobson, DC
Gossmann, HJ
Rafferty, CS
Citation: R. Kalyanaraman et al., Quantification of excess vacancy defects from high-energy ion implantationin Si by Au labeling, APPL PHYS L, 76(23), 2000, pp. 3379-3381
Authors:
Oktyabrsky, S
Kalyanaraman, R
Jagannadham, K
Narayan, J
Citation: S. Oktyabrsky et al., Dislocation structure of low-angle grain boundaries in YBa2Cu3O7-delta/MgOfilms, J MATER RES, 14(7), 1999, pp. 2764-2772