AAAAAA

   
Results: 1-12 |
Results: 12
PREVAIL e-beam stepper alpha tool
Authors: Pfeiffer, HC Dhaliwal, RS Golladay, SD Doran, SK Gordon, MS Kendall, RA Lieberman, JE Pinckney, DJ Quickle, RJ Robinson, CF Rockrohr, JD Stickel, W Tressler, EV Tanimoto, A Yamaguchi, T Okamoto, K Suzuki, K Miura, T Okino, T Kawata, S Morita, K Suzuki, SC Shimizu, H Kojima, S Varnell, G Novak, WT Sogard, A
Citation: Hc. Pfeiffer et al., PREVAIL e-beam stepper alpha tool, MICROEL ENG, 57-8, 2001, pp. 163-172
Prevail - Electron projection technology approach for next-generation lithography
Authors: Dhaliwal, RS Enichen, WA Golladay, SD Gordon, MS Kendall, RA Lieberman, JE Pfeiffer, HC Pinckney, DJ Robinson, CF Rockrohr, JD Stickel, W Tressler, EV
Citation: Rs. Dhaliwal et al., Prevail - Electron projection technology approach for next-generation lithography, IBM J RES, 45(5), 2001, pp. 615-638
Ab initio potential energy surface for the Ar(S-1) plus OH(X-2 Pi) interaction and bound rovibrational states
Authors: Klos, J Chalasinski, G Berry, MT Kendall, RA Burcl, R Szczesniak, MM Cybulski, SM
Citation: J. Klos et al., Ab initio potential energy surface for the Ar(S-1) plus OH(X-2 Pi) interaction and bound rovibrational states, J CHEM PHYS, 112(11), 2000, pp. 4952-4958
High performance computational chemistry: An overview of NWChem a distributed parallel application
Authors: Kendall, RA Apra, E Bernholdt, DE Bylaska, EJ Dupuis, M Fann, GI Harrison, RJ Ju, JL Nichols, JA Nieplocha, J Straatsma, TP Windus, TL Wong, AT
Citation: Ra. Kendall et al., High performance computational chemistry: An overview of NWChem a distributed parallel application, COMP PHYS C, 128(1-2), 2000, pp. 260-283
High performance computational chemistry: Hartree-Fock electronic structure calculations on massively parallel processors
Authors: Tilson, JL Minkoff, M Wagner, AK Shepard, R Sutton, P Harrison, RJ Kendall, RA Wong, AT
Citation: Jl. Tilson et al., High performance computational chemistry: Hartree-Fock electronic structure calculations on massively parallel processors, INT J HI PE, 13(4), 1999, pp. 291-302
Measuring electron-beam landing angle in real time
Authors: Sturans, MA Hartley, JG Kendall, RA
Citation: Ma. Sturans et al., Measuring electron-beam landing angle in real time, J VAC SCI B, 17(6), 1999, pp. 2823-2826
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
Authors: Pfeiffer, HC Dhaliwal, RS Golladay, SD Doran, SK Gordon, MS Groves, TR Kendall, RA Lieberman, JE Petric, PF Pinckney, DJ Quickle, RJ Robinson, CF Rockrohr, JD Senesi, JJ Stickel, W Tressler, EV Tanimoto, A Yamaguchi, T Okamoto, K Suzuki, K Okino, T Kawata, S Morita, K Suziki, SC Shimizu, H Kojima, S Varnell, G Novak, WT Stumbo, DP Sogard, M
Citation: Hc. Pfeiffer et al., Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J VAC SCI B, 17(6), 1999, pp. 2840-2846
High emittance source for the PREVAIL projection lithography system
Authors: Golladay, SD Kendall, RA Doran, SK
Citation: Sd. Golladay et al., High emittance source for the PREVAIL projection lithography system, J VAC SCI B, 17(6), 1999, pp. 2856-2859
Edward C. Carterette, 1921-1999
Authors: Kendall, RA
Citation: Ra. Kendall, Edward C. Carterette, 1921-1999, MUSIC PERC, 17(1), 1999, pp. 1-4
Perceptual and acoustical features of natural and synthetic orchestral instrument tones
Authors: Kendall, RA Carterette, EC Hajda, JM
Citation: Ra. Kendall et al., Perceptual and acoustical features of natural and synthetic orchestral instrument tones, MUSIC PERC, 16(3), 1999, pp. 327-363
EL5: One tool for advanced x-ray and chrome on glass mask making
Authors: Sturans, MA Hartley, JG Pfeiffer, HC Dhaliwal, RS Groves, TR Pavick, JW Quickle, RJ Clement, CS Dick, GJ Enichen, WA Gordon, MS Kendall, RA Kostek, CA Pinckney, DJ Robinson, CF Rockrohr, JD Safran, JM Senesi, JJ Tressler, EV
Citation: Ma. Sturans et al., EL5: One tool for advanced x-ray and chrome on glass mask making, J VAC SCI B, 16(6), 1998, pp. 3164-3167
Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
Authors: Groves, TR Kendall, RA
Citation: Tr. Groves et Ra. Kendall, Distributed, multiple variable shaped electron beam column for high throughput maskless lithography, J VAC SCI B, 16(6), 1998, pp. 3168-3173
Risultati: 1-12 |