Login
|
New Account
AAAAAA
ITA
ENG
Results:
1-6
|
Results: 6
A fully planarized 4H-SiC trench MOS barrier Schottky (TMBS) rectifier
Authors:
Khemka, V Ananthan, V Chow, TP
Citation:
V. Khemka et al., A fully planarized 4H-SiC trench MOS barrier Schottky (TMBS) rectifier, IEEE ELEC D, 21(6), 2000, pp. 286-288
SiC and GaN bipolar power devices
Authors:
Chow, TP Khemka, V Fedison, J Ramungul, N Matocha, K Tang, Y Gutmann, RJ
Citation:
Tp. Chow et al., SiC and GaN bipolar power devices, SOL ST ELEC, 44(2), 2000, pp. 277-301
Re-oxidation characteristics of oxynitrides on 3C- and 4H-SiC
Authors:
Chatty, K Khemka, V Chow, TP Gutmann, RJ
Citation:
K. Chatty et al., Re-oxidation characteristics of oxynitrides on 3C- and 4H-SiC, J ELEC MAT, 28(3), 1999, pp. 161-166
Characterization of phosphorus implantation in 4H-SiC
Authors:
Khemka, V Patel, R Ramungul, N Chow, TP Ghezzo, M Kretchmer, J
Citation:
V. Khemka et al., Characterization of phosphorus implantation in 4H-SiC, J ELEC MAT, 28(3), 1999, pp. 167-174
Design considerations and experimental analysis for silicon carbide power rectifiers
Authors:
Khemka, V Patel, R Chow, TP Gutmann, RJ
Citation:
V. Khemka et al., Design considerations and experimental analysis for silicon carbide power rectifiers, SOL ST ELEC, 43(10), 1999, pp. 1945-1962
6H-SiC P+N junctions fabricated by beryllium implantation
Authors:
Ramungul, N Khemka, V Zheng, YP Patel, R Chow, TP
Citation:
N. Ramungul et al., 6H-SiC P+N junctions fabricated by beryllium implantation, IEEE DEVICE, 46(3), 1999, pp. 465-470
Risultati:
1-6
|