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Results: 1-5 |
Results: 5

Authors: Peeva, A Fichtner, PFP Behar, M Koegler, R Skorupa, W
Citation: A. Peeva et al., Helium implantation induced metal gettering in silicon at half of the projected ion range, NUCL INST B, 175, 2001, pp. 176-181

Authors: da Silva, DL Fichtner, PFP Peeva, A Behar, M Koegler, R Skorupa, W
Citation: Dl. Da Silva et al., The effects of implantation temperature on He bubble formation in silicon, NUCL INST B, 175, 2001, pp. 335-339

Authors: Peeva, A Koegler, R Brauer, G Werner, P Skorupa, W
Citation: A. Peeva et al., Metallic impurity gettering to defects remaining in the R-P/2 region of MeV-ion implanted and annealed silicon, MAT SC S PR, 3(4), 2000, pp. 297-301

Authors: Fichtner, PFP Peeva, A Behar, M Azevedo, GD Maltez, RL Koegler, R Skorupa, W
Citation: Pfp. Fichtner et al., He-induced cavity formation in silicon upon high-temperature implantation, NUCL INST B, 161, 2000, pp. 1038-1042

Authors: Fichtner, PFP Behar, M Kaschny, JR Peeva, A Koegler, R Skorupa, W
Citation: Pfp. Fichtner et al., Copper gettering at half the projected ion range induced by low-energy channeling He implantation into silicon, APPL PHYS L, 77(7), 2000, pp. 972-974
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