Authors:
Peeva, A
Fichtner, PFP
Behar, M
Koegler, R
Skorupa, W
Citation: A. Peeva et al., Helium implantation induced metal gettering in silicon at half of the projected ion range, NUCL INST B, 175, 2001, pp. 176-181
Authors:
Peeva, A
Koegler, R
Brauer, G
Werner, P
Skorupa, W
Citation: A. Peeva et al., Metallic impurity gettering to defects remaining in the R-P/2 region of MeV-ion implanted and annealed silicon, MAT SC S PR, 3(4), 2000, pp. 297-301
Authors:
Fichtner, PFP
Behar, M
Kaschny, JR
Peeva, A
Koegler, R
Skorupa, W
Citation: Pfp. Fichtner et al., Copper gettering at half the projected ion range induced by low-energy channeling He implantation into silicon, APPL PHYS L, 77(7), 2000, pp. 972-974