Authors:
Haag, MC
Krug, C
Dupont, J
de Galland, GB
dos Santos, JHZ
Uozumi, T
Sano, T
Soga, K
Citation: Mc. Haag et al., Effects of Al/Zr ratio on ethylene-propylene copolymerization with supported-zirconocene catalysts, J MOL CAT A, 169(1-2), 2001, pp. 275-287
Authors:
Krug, C
da Rosa, EBO
de Almeida, RMC
Morais, J
Baumvol, IJR
Salgado, TDM
Stedile, FC
Citation: C. Krug et al., Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" - Reply, PHYS REV L, 86(20), 2001, pp. 4714-4714
Authors:
Krug, C
da Rosa, EBO
de Almeida, RMC
Morais, J
Baumvol, IJR
Salgado, TDM
Stedile, FC
Citation: C. Krug et al., Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si, PHYS REV L, 85(19), 2000, pp. 4120-4123
Authors:
dos Santos, JHZ
Krug, C
da Rosa, MB
Stedile, FC
Dupont, J
Forte, MD
Citation: Jhz. Dos Santos et al., The effect of silica dehydroxylation temperature on the activity of SiO2-supported zirconocene catalysts, J MOL CAT A, 139(2-3), 1999, pp. 199-207
Authors:
dos Santos, JHZ
Larentis, A
da Rosa, MB
Krug, C
Baumvol, IJB
Dupont, J
Stedile, FC
Forte, MD
Citation: Jhz. Dos Santos et al., Optimization of a silica supported bis(butylcyclopentadienyl)zirconium dichloride catalyst for ethylene polymerization, MACRO CH P, 200(4), 1999, pp. 751-757
Authors:
dos Santos, JHZ
Da Rosa, MB
Krug, C
Stedile, FC
Haag, MC
Dupont, J
Forte, MD
Citation: Jhz. Dos Santos et al., Effects of ethylene polymerization conditions on the activity of SiO2-supported zirconocene and on polymer properties, J POL SC PC, 37(13), 1999, pp. 1987-1996
Authors:
Salgado, TDM
Stedile, FC
Krug, C
Baumvol, IJR
Radtke, C
Citation: Tdm. Salgado et al., Very low energy nitrogen implantation for ultrathin silicon oxynitride film formation, NUCL INST B, 148(1-4), 1999, pp. 252-256
Authors:
Baumvol, IJR
Krug, C
Stedile, FC
Gorris, F
Schulte, WH
Citation: Ijr. Baumvol et al., Isotopic substitution of Si during thermal growth of ultrathin silicon-oxide films on Si(111) in O-2, PHYS REV B, 60(3), 1999, pp. 1492-1495
Authors:
Salgado, TDM
Radtke, C
Krug, C
de Andrade, J
Baumvol, IJR
Citation: Tdm. Salgado et al., Effects of the final oxidation step on N and O distributions in silicon oxide/nitride/oxide ultrathin films, J ELCHEM SO, 146(10), 1999, pp. 3788-3793
Authors:
Baumvol, IJR
Salgado, TDM
Stedile, FC
Radtke, C
Krug, C
Citation: Ijr. Baumvol et al., Isotopic substitution of N, O, and Si in the thermal oxidation of nitrogen-deposited silicon, APPL PHYS L, 74(13), 1999, pp. 1872-1874