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Results: 1-17 |
Results: 17

Authors: Haag, MC Krug, C Dupont, J de Galland, GB dos Santos, JHZ Uozumi, T Sano, T Soga, K
Citation: Mc. Haag et al., Effects of Al/Zr ratio on ethylene-propylene copolymerization with supported-zirconocene catalysts, J MOL CAT A, 169(1-2), 2001, pp. 275-287

Authors: Yoder, CH Schaeffer, CD Walton, LL Falen, PL Redline, JK Han, S Shah, M Krug, C Lao, SD
Citation: Ch. Yoder et al., The role of conformational flexibility in the hypervalency of organosilanes, MAIN GR MET, 24(7), 2001, pp. 409-411

Authors: Krug, C Salgado, TDM Stedile, FC Baumvol, IJR
Citation: C. Krug et al., Low energy nitrogen implantation into Si and SiO2/Si, NUCL INST B, 175, 2001, pp. 694-698

Authors: Krug, C Radtke, C Stedile, FC Baumvol, IJR
Citation: C. Krug et al., Isotope-beam modification of materials at eV energies, NUCL INST B, 175, 2001, pp. 705-710

Authors: Krug, C da Rosa, EBO de Almeida, RMC Morais, J Baumvol, IJR Salgado, TDM Stedile, FC
Citation: C. Krug et al., Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" - Reply, PHYS REV L, 86(20), 2001, pp. 4714-4714

Authors: Krug, C da Rosa, EBO de Almeida, RMC Morais, J Baumvol, IJR Salgado, TDM Stedile, FC
Citation: C. Krug et al., Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si, PHYS REV L, 85(19), 2000, pp. 4120-4123

Authors: Gusev, EP Copel, M Cartier, E Baumvol, IJR Krug, C Gribelyuk, MA
Citation: Ep. Gusev et al., High-resolution depth profiling in ultrathin Al2O3 films on Si, APPL PHYS L, 76(2), 2000, pp. 176-178

Authors: dos Santos, JHZ Krug, C da Rosa, MB Stedile, FC Dupont, J Forte, MD
Citation: Jhz. Dos Santos et al., The effect of silica dehydroxylation temperature on the activity of SiO2-supported zirconocene catalysts, J MOL CAT A, 139(2-3), 1999, pp. 199-207

Authors: dos Santos, JHZ Larentis, A da Rosa, MB Krug, C Baumvol, IJB Dupont, J Stedile, FC Forte, MD
Citation: Jhz. Dos Santos et al., Optimization of a silica supported bis(butylcyclopentadienyl)zirconium dichloride catalyst for ethylene polymerization, MACRO CH P, 200(4), 1999, pp. 751-757

Authors: dos Santos, JHZ Da Rosa, MB Krug, C Stedile, FC Haag, MC Dupont, J Forte, MD
Citation: Jhz. Dos Santos et al., Effects of ethylene polymerization conditions on the activity of SiO2-supported zirconocene and on polymer properties, J POL SC PC, 37(13), 1999, pp. 1987-1996

Authors: Salgado, TDM Stedile, FC Krug, C Baumvol, IJR Radtke, C
Citation: Tdm. Salgado et al., Very low energy nitrogen implantation for ultrathin silicon oxynitride film formation, NUCL INST B, 148(1-4), 1999, pp. 252-256

Authors: Baumvol, IJR Krug, C Stedile, FC Gorris, F Schulte, WH
Citation: Ijr. Baumvol et al., Isotopic substitution of Si during thermal growth of ultrathin silicon-oxide films on Si(111) in O-2, PHYS REV B, 60(3), 1999, pp. 1492-1495

Authors: Gorris, F Krug, C Kubsky, S Baumvol, IJR Schulte, WH Rolfs, C
Citation: F. Gorris et al., Production of thin epitaxial films using ion beam deposition, PHYS ST S-A, 173(1), 1999, pp. 167-173

Authors: Salgado, TDM Radtke, C Krug, C de Andrade, J Baumvol, IJR
Citation: Tdm. Salgado et al., Effects of the final oxidation step on N and O distributions in silicon oxide/nitride/oxide ultrathin films, J ELCHEM SO, 146(10), 1999, pp. 3788-3793

Authors: Baumvol, IJR Krug, C Stedile, FC Green, ML Jacobson, DC Eaglesham, D Bernstein, JD Shao, J Denholm, AS Kellerman, PL
Citation: Ijr. Baumvol et al., Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation, APPL PHYS L, 74(6), 1999, pp. 806-808

Authors: Baumvol, IJR Salgado, TDM Stedile, FC Radtke, C Krug, C
Citation: Ijr. Baumvol et al., Isotopic substitution of N, O, and Si in the thermal oxidation of nitrogen-deposited silicon, APPL PHYS L, 74(13), 1999, pp. 1872-1874

Authors: Steinwachs, MR Haag, M Krug, C Erggelet, C Reichelt, A
Citation: Mr. Steinwachs et al., A ganglion of the spinoglenoid notch, J SHOUL ELB, 7(5), 1998, pp. 550-554
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