Citation: G. Radhakrishnan et Jr. Lince, PHOTOLYTIC DEPOSITION OF ALUMINUM NITRIDE AND OXY-NITRIDE FILMS AT TEMPERATURES LESS-THAN-OR-EQUAL-TO-350K, Journal of electronic materials, 25(1), 1996, pp. 69-74
Citation: Jr. Lince et al., METAL INCORPORATION IN SPUTTER-DEPOSITED MOS2 FILMS STUDIED BY EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE, Journal of materials research, 10(8), 1995, pp. 2091-2105
Authors:
DURBIN TD
LINCE JR
DIDZIULIS SV
SHUH DK
YARMOFF JA
Citation: Td. Durbin et al., SOFT-X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE INTERACTION OF CR WITH MOS2(0001), Surface science, 302(3), 1994, pp. 314-328
Authors:
DIDZIULIS SV
LINCE JR
STEWART TB
EKLUND EA
Citation: Sv. Didziulis et al., PHOTOELECTRON SPECTROSCOPIC STUDIES OF THE ELECTRONIC-STRUCTURE AND BONDING IN TIC AND TIN, Inorganic chemistry, 33(9), 1994, pp. 1979-1991