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Results:
1-7
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Results: 7
Authors:
LOONG WA
CHEN CW
CHANG YH
LIN CM
CUI Z
LUNG CA
Citation: Wa. Loong et al., TISIXOY AS AN ABSORPTIVE SHIFTER FOR EMBEDDED PHASE-SHIFTING MASK IN 248 NM AND THE MODIFICATION OF R-T METHOD FOR THE DETERMINATION OF SHIFTERS N AND K, Microelectronic engineering, 42, 1998, pp. 125-128
Authors:
LOONG WA
TSENG JC
CHEN TC
LUNG CA
Citation: Wa. Loong et al., STUDY ON OPTIMIZATION OF ANNULAR OFF-AXIS ILLUMINATION USING TAGUCHI METHOD FOR 0.35-MU-M DENSE LINE SPACE/, Microelectronic engineering, 35(1-4), 1997, pp. 461-464
Authors:
LOONG WA
CHEN TC
TSENG JC
Citation: Wa. Loong et al., TINX AS A NEW EMBEDDED MATERIAL FOR ATTENUATED PHASE-SHIFT MASK, Microelectronic engineering, 30(1-4), 1996, pp. 157-160
Authors:
LOONG WA
SHY SL
LIN YC
Citation: Wa. Loong et al., 0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA, Microelectronic engineering, 27(1-4), 1995, pp. 275-278
Authors:
LOONG WA
SHY SL
GUO GC
YANG MT
SU SY
Citation: Wa. Loong et al., CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATION, Microelectronic engineering, 23(1-4), 1994, pp. 175-178
Authors:
LOONG WA
YEN MS
WANG FC
HSU BY
LIU YL
Citation: Wa. Loong et al., ENHANCED O2 PLASMA STRIPPING OF P+ AND SI+ IMPLANTED NEGATIVE RESIST BY H2 PLASMA PRETREATMENT, Microelectronic engineering, 21(1-4), 1993, pp. 259-262
Authors:
LOONG WA
CHIU KD
Citation: Wa. Loong et Kd. Chiu, TITANIUM MONONITRIDE AS AN ANTIREFLECTION LAYER ON ALUMINUM METALLIZATION FOR SUBMICRON PHOTOLITHOGRAPHIC PATTERNING, Semiconductor science and technology, 6(12), 1991, pp. 1170-1174
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1-7
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