Citation: Ea. Rietman et al., Use of orthogonal polynomial functions for endpoint detection during plasma etching of patterned wafers, J VAC SCI B, 18(5), 2000, pp. 2500-2504
Citation: Ea. Rietman et N. Layadi, A study on R-m -> R-1 maps: Application to a 0.16-mu m via etch process endpoint, IEEE SEMIC, 13(4), 2000, pp. 457-468
Authors:
Malyshev, MV
Donnelly, VM
Downey, SW
Colonell, JI
Layadi, N
Citation: Mv. Malyshev et al., Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage, J VAC SCI A, 18(3), 2000, pp. 849-859
Authors:
Farrow, RC
Gallatin, GM
Waskiewicz, WK
Liddle, JA
Kizilyalli, I
Kornblit, A
Biddick, C
Blakey, M
Klemens, F
Felker, J
Kraus, J
Mkrtchyan, M
Orphanos, PA
Layadi, N
Merchant, S
Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312
Authors:
Layadi, N
Molloy, SJ
Esry, TC
Lill, T
Trevor, J
Grimbergen, MN
Chinn, J
Citation: N. Layadi et al., Interferometry for end point prediction during plasma etching of various structures in complementary metal-oxide-semiconductor device fabrication, J VAC SCI B, 17(6), 1999, pp. 2630-2637