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Results: 1-12 |
Results: 12
Pinch plasma radiation sources for the extreme ultraviolet
Authors: Neff, W Bergmann, K Rosier, O Lebert, R Juschkin, L
Citation: W. Neff et al., Pinch plasma radiation sources for the extreme ultraviolet, CONTR PLASM, 41(6), 2001, pp. 589-597
A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography
Authors: Bergmann, K Rosier, O Lebert, R Neff, W Poprawe, R
Citation: K. Bergmann et al., A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography, MICROEL ENG, 57-8, 2001, pp. 71-77
Preliminary results from key experiments on sources for EUV lithography
Authors: Lebert, R Aschke, L Bergmann, K Dusterer, S Gabel, K Hoffmann, D Loosen, P Neff, W Nickles, P Rosier, O Poprawe, R Rudolph, D Sandner, W Sauerbrey, R Schmahl, G Schwoerer, H Stiehl, H Will, I Ziener, C
Citation: R. Lebert et al., Preliminary results from key experiments on sources for EUV lithography, MICROEL ENG, 57-8, 2001, pp. 87-92
KeV ion beam generation from Z-pinches produced in plasma focus like geometry
Authors: Engel, A Choi, P Koshelev, KN Lebert, R
Citation: A. Engel et al., KeV ion beam generation from Z-pinches produced in plasma focus like geometry, CONTR PLASM, 40(1-2), 2000, pp. 101-105
Electrode phenomena and lifetime considerations in a radial multichannel pseudospark switch
Authors: Bergmann, K Muller, M Reichartz, D Neff, W Lebert, R
Citation: K. Bergmann et al., Electrode phenomena and lifetime considerations in a radial multichannel pseudospark switch, IEEE PLAS S, 28(5), 2000, pp. 1486-1490
Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency
Authors: Bergmann, K Rosier, O Neff, W Lebert, R
Citation: K. Bergmann et al., Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency, APPL OPTICS, 39(22), 2000, pp. 3833-3837
Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target
Authors: Schriever, G Bergmann, K Lebert, R
Citation: G. Schriever et al., Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target, J VAC SCI B, 17(5), 1999, pp. 2058-2060
A gas discharged based radiation source for EUV-lithography
Authors: Lebert, R Bergmann, K Schriever, G Neff, W
Citation: R. Lebert et al., A gas discharged based radiation source for EUV-lithography, MICROEL ENG, 46(1-4), 1999, pp. 449-452
Comparison of laser produced and gas discharge based EUV sources for different applications
Authors: Lebert, R Bergmann, K Schriever, G Neff, W
Citation: R. Lebert et al., Comparison of laser produced and gas discharge based EUV sources for different applications, MICROEL ENG, 46(1-4), 1999, pp. 465-468
Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
Authors: Bergmann, K Schriever, G Rosier, O Muller, M Neff, W Lebert, R
Citation: K. Bergmann et al., Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma, APPL OPTICS, 38(25), 1999, pp. 5413-5417
Population inversion due to charge-exchange interaction of plasma jets from plasma focus with residual gas
Authors: Engel, A Koshelev, KN Sidelnikov, YV Churilov, SS Gavrilescu, C Lebert, R
Citation: A. Engel et al., Population inversion due to charge-exchange interaction of plasma jets from plasma focus with residual gas, PHYS REV E, 58(6), 1998, pp. 7819-7822
Diode pumped Cr3+: LiCAF fs-laser
Authors: Gabel, KM Russbuldt, P Lebert, R Valster, A
Citation: Km. Gabel et al., Diode pumped Cr3+: LiCAF fs-laser, OPT COMMUN, 157(1-6), 1998, pp. 327-334
Risultati: 1-12 |