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Results:
1-14
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Results: 14
Authors:
HASHIKAWA N
FUKUMOTO K
KUROI T
IKENO M
MASHIKO Y
Citation: N. Hashikawa et al., DIRECT OBSERVATION OF LOCAL STRAIN FIELD FOR ULSI DEVICES, Microelectronics and reliability, 38(6-8), 1998, pp. 913-917
Authors:
MASHIKO Y
BASILI VR
Citation: Y. Mashiko et Vr. Basili, USING THE GQM PARADIGM TO INVESTIGATE INFLUENTIAL FACTORS FOR SOFTWARE PROCESS IMPROVEMENT, The Journal of systems and software, 36(1), 1997, pp. 17-32
Authors:
MAZUMDER MK
KOBAYASHI K
OGATA T
MITSUHASHI J
MASHIKO Y
KAWAZU S
SEKINE M
KOYAMA H
YASUOKA A
Citation: Mk. Mazumder et al., IMPROVED RELIABILITY OF WET OXIDIZED NITRIDE MOS CAPACITORS IN COMPARISON TO RTP N2O OXIDIZED NITRIDE FILMS, Solid-state electronics, 41(5), 1997, pp. 749-755
Authors:
MAZUMDER MK
KOBAYASHI K
OGATA T
MITSUHASHI JI
MASHIKO Y
KAWAZU S
SEKINE M
KOYAMA H
YASUOKA A
Citation: Mk. Mazumder et al., NITRIDE THICKNESS DEPENDENCE OF TRAP GENERATION AND NEGATIVE STRESS-INDUCED CURRENT IN OXIDIZED NITRIDE FILMS (LESS-THAN-5 NM), Solid-state electronics, 41(4), 1997, pp. 613-617
Authors:
MASHIKO Y
YOSHIDA M
KOGA M
Citation: Y. Mashiko et al., SYNTHESIS OF CHLOROPRENE AND ALPHA-CYANOETHYL ACRYLATE COPOLYMER AND ITS CHARACTERIZATION, Polymer, 38(18), 1997, pp. 4757-4763
Authors:
KANROJI Y
MASHIKO Y
Citation: Y. Kanroji et Y. Mashiko, THE DETERIORATION OF HOT-SPRING RESOURCES AND THE CHANGE OF CHEMICAL-CONSTITUENTS WITH THE DEVELOPMENT OF SPA, Yakugaku zasshi, 117(10-11), 1997, pp. 836-849
Authors:
MASHIKO Y
OHSAKI A
OKAMOTO T
FUKUMOTO K
KOYAMA H
Citation: Y. Mashiko et al., FORMATION MECHANISMS OF THE DEFORMED OXIDE LAYER IN A TUNGSTEN POLYCIDE STRUCTURE, JPN J A P 1, 35(2A), 1996, pp. 584-588
Authors:
KATSUMATA M
MITSUHASHI J
KOBAYASHI K
MASHIKO Y
KOYAMA H
Citation: M. Katsumata et al., RELIABILITY EVALUATION OF THIN GATE OXIDE USING A FLAT CAPACITOR TESTSTRUCTURE, IEICE transactions on electronics, E79C(2), 1996, pp. 206-210
Authors:
MASHIKO Y
KOYAMA T
KOYAMA H
Citation: Y. Mashiko et al., A NEW FAILURE ANALYSIS TECHNIQUE USING THE THERMO-ELECTROMOTIVE FORCEINDUCED BY LASER IRRADIATION, Quality and reliability engineering international, 12(4), 1996, pp. 253-257
Authors:
MAZUMDER MK
KOBAYASHI K
MASHIKO Y
KOYAMA H
Citation: Mk. Mazumder et al., NEGATIVE STRESS-INDUCED CURRENT IN OXIDIZED NITRIDE LAYERS OF DIFFERENT NITRIDE THICKNESSES (LESS-THAN-5 NM), Solid-state electronics, 39(3), 1996, pp. 349-353
Authors:
MAZUMDER MK
KOBAYASHI K
OGATA T
MITSUHASHI J
MASHIKO Y
KOYAMA H
Citation: Mk. Mazumder et al., CONDUCTION AND CHARGE-TRAPPING CHARACTERISTICS OF MOS CAPACITORS WITHOXIDIZED NITRIDE FILMS OF DIFFERENT NITRIDE THICKNESSES UNDER POSITIVE STRESS BIAS, Journal of the Electrochemical Society, 143(1), 1996, pp. 368-373
Authors:
MAZUMDER MK
KATAYAMA T
KOBAYASHI K
MASHIKO Y
KOYAMA H
YASUOKA A
Citation: Mk. Mazumder et al., EFFECTS OF THE OXIDATION PROCESS ON THE ELECTRICAL CHARACTERISTICS OFOXIDIZED NITRIDE FILMS, Applied physics letters, 69(8), 1996, pp. 1140-1142
Authors:
MAZUMDER MK
MASHIKO Y
KOYAMA MH
TAKAKUWA Y
MIYAMOTO N
Citation: Mk. Mazumder et al., GENERATION KINETICS OF PYRAMIDAL HILLOCK AND CRYSTALLOGRAPHIC DEFECT ON SI(111) VICINAL SURFACES GROWN WITH SIH2CL2, Journal of crystal growth, 155(3-4), 1995, pp. 183-192
Authors:
MAZUMDER MK
MASHIKO Y
KOYAMA H
TAKAKUWA Y
MIYAMOTO N
Citation: Mk. Mazumder et al., VARIATION OF SIZE AND DENSITY OF PYRAMIDAL HILLOCK DURING EPITAXIAL-GROWTH OF SILICON USING DICHLOROSILANE GAS, Journal of the Electrochemical Society, 142(11), 1995, pp. 3956-3961
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