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Results: 1-11 |
Results: 11
HYDROGENATED AMORPHOUS AND POLYCRYSTALLINE SILICON TFTS BY HOT-WIRE CVD
Authors: MEILING H BROCKHOFF AM RATH JK SCHROPP REI
Citation: H. Meiling et al., HYDROGENATED AMORPHOUS AND POLYCRYSTALLINE SILICON TFTS BY HOT-WIRE CVD, Journal of non-crystalline solids, 230, 1998, pp. 1202-1206
STRUCTURAL-PROPERTIES OF A-SI-H RELATED TO ION ENERGY-DISTRIBUTIONS IN VHF SILANE DEPOSITION PLASMAS
Authors: HAMERS EAG VANSARK WGJHM BEZEMER J MEILING H VANDERWEG WF
Citation: Eag. Hamers et al., STRUCTURAL-PROPERTIES OF A-SI-H RELATED TO ION ENERGY-DISTRIBUTIONS IN VHF SILANE DEPOSITION PLASMAS, Journal of non-crystalline solids, 226(3), 1998, pp. 205-216
STRUCTURE AND HYDROGEN CONTENT OF STABLE HOT-WIRE-DEPOSITED AMORPHOUS-SILICON
Authors: BROCKHOFF AM ULLERSMA EHC MEILING H HABRAKEN FHPM VANDERWEG WF
Citation: Am. Brockhoff et al., STRUCTURE AND HYDROGEN CONTENT OF STABLE HOT-WIRE-DEPOSITED AMORPHOUS-SILICON, Applied physics letters, 73(22), 1998, pp. 3244-3246
PURELY INTRINSIC POLYSILICON FILMS FOR N-I-P SOLAR-CELLS
Authors: RATH JK MEILING H SCHROPP REI
Citation: Jk. Rath et al., PURELY INTRINSIC POLYSILICON FILMS FOR N-I-P SOLAR-CELLS, JPN J A P 1, 36(9A), 1997, pp. 5436-5443
DEVICE-QUALITY POLYCRYSTALLINE AND AMORPHOUS-SILICON FILMS BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION
Authors: SCHROPP REI FEENSTRA KE MOLENBROEK EC MEILING H RATH JK
Citation: Rei. Schropp et al., DEVICE-QUALITY POLYCRYSTALLINE AND AMORPHOUS-SILICON FILMS BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION, Philosophical magazine. B. Physics of condensed matter. Statistical mechanics, electronic, optical and magnetic, 76(3), 1997, pp. 309-321
LOW-TEMPERATURE DEPOSITION OF POLYCRYSTALLINE SILICON THIN-FILMS BY HOT-WIRE CVD
Authors: RATH JK MEILING H SCHROPP REI
Citation: Jk. Rath et al., LOW-TEMPERATURE DEPOSITION OF POLYCRYSTALLINE SILICON THIN-FILMS BY HOT-WIRE CVD, Solar energy materials and solar cells, 48(1-4), 1997, pp. 269-277
INHOMOGENEITIES IN PECVD DEPOSITED ALPHA-SI-H FILMS INDUCED BY A SPACING BETWEEN SUBSTRATE AND SUBSTRATE HOLDER
Authors: VANSARK WGJHM MEILING H BEZEMER J VONDERLINDEN MB SCHROPP REI VANDERWEG WF
Citation: Wgjhm. Vansark et al., INHOMOGENEITIES IN PECVD DEPOSITED ALPHA-SI-H FILMS INDUCED BY A SPACING BETWEEN SUBSTRATE AND SUBSTRATE HOLDER, Solar energy materials and solar cells, 45(1), 1997, pp. 57-63
SHEATH THICKNESS IN VERY-HIGH-FREQUENCY PLASMA CHEMICAL-VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
Authors: VANSARK WGJHM MEILING H HAMERS EAG BEZEMER J VANDERWEG WF
Citation: Wgjhm. Vansark et al., SHEATH THICKNESS IN VERY-HIGH-FREQUENCY PLASMA CHEMICAL-VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 654-658
STABLE AMORPHOUS-SILICON THIN-FILM TRANSISTORS
Authors: MEILING H SCHROPP REI
Citation: H. Meiling et Rei. Schropp, STABLE AMORPHOUS-SILICON THIN-FILM TRANSISTORS, Applied physics letters, 70(20), 1997, pp. 2681-2683
DEPOSITION-RATE REDUCTION THROUGH IMPROPER SUBSTRATE-TO-ELECTRODE ATTACHMENT IN VERY-HIGH-FREQUENCY DEPOSITION OF A-SI-H
Authors: MEILING H VANSARK WGJHM BEZEMER J VANDERWEG WF
Citation: H. Meiling et al., DEPOSITION-RATE REDUCTION THROUGH IMPROPER SUBSTRATE-TO-ELECTRODE ATTACHMENT IN VERY-HIGH-FREQUENCY DEPOSITION OF A-SI-H, Journal of applied physics, 80(6), 1996, pp. 3546-3551
STABILITY OF HOT-WIRE DEPOSITED AMORPHOUS-SILICON THIN-FILM TRANSISTORS
Authors: MEILING H SCHROPP REI
Citation: H. Meiling et Rei. Schropp, STABILITY OF HOT-WIRE DEPOSITED AMORPHOUS-SILICON THIN-FILM TRANSISTORS, Applied physics letters, 69(8), 1996, pp. 1062-1064
Risultati: 1-11 |