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Results: 1-7 |
Results: 7

Authors: MOSHKALYOV SA MACHIDA M CAMPOS DO DULKIN A
Citation: Sa. Moshkalyov et al., SPATIALLY-RESOLVED OPTICAL-EMISSION STUDY OF SPUTTERING IN REACTIVE PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(2), 1998, pp. 514-523

Authors: MOSHKALYOV SA MACHIDA M CAMPOS DO
Citation: Sa. Moshkalyov et al., STUDY OF ION-INDUCED SECONDARY PHOTON-EMISSION IN REACTIVE ION ETCHING EXPERIMENT, JPN J A P 1, 36(7B), 1997, pp. 4675-4681

Authors: MOSHKALYOV SA DINIZ JA SWART JW TATSCH PJ MACHIDA M
Citation: Sa. Moshkalyov et al., DEPOSITION OF SILICON-NITRIDE BY LOW-PRESSURE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION IN N-2 AR/SIH4/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2682-2687

Authors: LEBEDEV SV MACHIDA M MOSHKALYOV SA CAMPOS DO
Citation: Sv. Lebedev et al., EXPERIMENTAL-STUDY OF THE PSEUDOSPARK-PRODUCED ELECTRON-BEAM FOR MATERIAL PROCESSING, IEEE transactions on plasma science, 25(4), 1997, pp. 754-757

Authors: CAMPOS DO MACHIDA M BERNI LA KANTOR M MOSHKALYOV SA LEBEDEV SV
Citation: Do. Campos et al., EXPERIMENTAL-STUDY OF CONVENTIONAL AND MULTIPASS THOMSON SCATTERING DIAGNOSTIC SYSTEMS, JPN J A P 1, 35(12A), 1996, pp. 6273-6274

Authors: MOSHKALYOV SA MACHIDA M LEBEDEV SV CAMPOS DO
Citation: Sa. Moshkalyov et al., A CONTRIBUTION OF VIBRATIONALLY EXCITED CL-2 MOLECULES TO GAAS REACTIVE ION ETCHING IN CL-2 AR/, JPN J A P 2, 35(7B), 1996, pp. 940-943

Authors: DULKIN AE PYATAEV VZ SOKOLOVA NO MOSHKALYOV SA SMIRNOV AS FROLOV KS
Citation: Ae. Dulkin et al., THE STUDY OF GAAS REACTIVE ION ETCHING IN CL2 AR/, Vacuum, 44(9), 1993, pp. 913-917
Risultati: 1-7 |