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Results:
1-7
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Results: 7
Authors:
ADACHI M
OKUYAMA K
FUJIMOTO T
SATO J
MUROYAMA M
Citation: M. Adachi et al., MORPHOLOGY CONTROL OF FILMS FORMED BY ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION USING TETRAETHYLORTHOSILICATE OZONE SYSTEM/, JPN J A P 1, 35(8), 1996, pp. 4438-4443
Authors:
KITOH H
MUROYAMA M
SASAKI M
IWASAWA M
KIMURA H
Citation: H. Kitoh et al., FORMATION OF SIOF FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING (C2H5O)(3)SIF, JPN J A P 1, 35(2B), 1996, pp. 1464-1467
Authors:
GOCHO T
OGAWA T
MUROYAMA M
SATO J
Citation: T. Gocho et al., CHEMICAL-VAPOR-DEPOSITION OF ANTIREFLECTIVE LAYER FILM FOR EXCIMER-LASER LITHOGRAPHY, JPN J A P 1, 33(1B), 1994, pp. 486-490
Authors:
KITOH H
MUROYAMA M
Citation: H. Kitoh et M. Muroyama, FORMATION OF SIN FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION USING [(CH3)(2)N]3SIN3, JPN J A P 1, 33(12B), 1994, pp. 7076-7079
Authors:
ADACHI M
OKUYAMA K
TOHGE N
SHIMADA M
SATO J
MUROYAMA M
Citation: M. Adachi et al., PRECURSORS IN ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF SILICA FILMS FROM TETRAETHYLORTHOSILICATE OZONE SYSTEM, JPN J A P 2, 33(3B), 1994, pp. 120000447-120000450
Authors:
MUROYAMA M
KAWASHIMA A
SATO J
Citation: M. Muroyama et al., FORMATION OF DIELECTRIC FILMS FOR GAP-FILLING BY NH3-ADDED H2O-TETRAETHOXYSILANE PLASMA CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 32(12B), 1993, pp. 6122-6125
Authors:
ADACHI M
OKUYAMA K
TOHGE N
SHIMADA M
SATO J
MUROYAMA M
Citation: M. Adachi et al., PARTICLE GENERATION AND FILM FORMATION IN AN ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR USING THE TETRAETHYLORTHOSILICATE (TEOS) HE, TEOS/O2/HE, AND TEOS/O3/HE SYSTEMS/, JPN J A P 2, 32(5B), 1993, pp. 120000748-120000751
Risultati:
1-7
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