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Citation: M. Micovic et al., AlGaN/GaN heterojunction field effect transistors grown by nitrogen plasmaassisted molecular beam epitaxy, IEEE DEVICE, 48(3), 2001, pp. 591-596
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Weber, ER
Micovic, M
Nguyen, C
Citation: S. Nozaki et al., Compression of the dc drain current by electron trapping in AlGaN/GaN modulation doped field-effect transistors, APPL PHYS L, 78(19), 2001, pp. 2896-2898
Authors:
Micovic, M
Matloubian, M
Hu, M
Harvey, DS
Nguyen, C
Janke, P
Citation: M. Micovic et al., Electrical characterisation of short gate In0.60Ga0.40As/In0.36Al0.64As0.84Sb0.16 high electron mobility transistors on InP substrate, ELECTR LETT, 36(4), 2000, pp. 357-358
Authors:
Lubyshev, D
Micovic, M
Gratteau, N
Cai, WZ
Miller, DL
Ray, O
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SpringThorpe, AJ
Citation: D. Lubyshev et al., A comparative study of carbon incorporation in heavily doped GaAs and Al0.3Ga0.7As grown by solid-source molecular beam epitaxy using carbon tetrabromide, J VAC SCI B, 17(3), 1999, pp. 1180-1184
Authors:
Ren, Y
Micovic, M
Cai, WZ
Mohney, S
Lord, SM
Miller, DL
Mayer, TS
Citation: Y. Ren et al., Effect of in situ annealing on highly-mismatched In0.75Ga0.25As on InP grown using molecular beam epitaxy, J ELEC MAT, 28(7), 1999, pp. 887-893
Authors:
Lubyshev, D
Micovic, M
Gratteau, N
Cai, WZ
Miller, DL
Ray, O
Pusep, YA
Silva, MTO
Galzerani, JC
Bacher, K
Citation: D. Lubyshev et al., Photoluminescence and Raman characterization of heavily doped Al0.3Ga0.7Asgrown by solid-source molecular beam epitaxy using carbon tetrabromide, J CRYST GR, 202, 1999, pp. 1089-1092