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Results: 26-44/44
Authors:
Jeurgens, LPH
Sloof, WG
Tichelaar, FD
Mittemeijer, EJ
Citation: Lph. Jeurgens et al., Thermodynamic stability of amorphous oxide films on metals: Application toaluminum oxide films on aluminum substrates, PHYS REV B, 62(7), 2000, pp. 4707-4719
Authors:
van Lier, J
Baretzky, B
Zalar, A
Mittemeijer, EJ
Citation: J. Van Lier et al., Reactions in TiO2/Ti3Al and TiO2/TiAl bilayers: application of target-factor analysis in Auger electron spectroscopy, SURF INT AN, 30(1), 2000, pp. 124-129
Authors:
Li, CM
Sommer, F
Mittemeijer, EJ
Citation: Cm. Li et al., Quantitative dilatometric analysis of the isothermal decomposition of Fe-Caustenite, Z METALLKUN, 91(1), 2000, pp. 5-9
Authors:
Graat, PCJ
Zandbergen, HW
Somers, MAJ
Mittemeijer, EJ
Citation: Pcj. Graat et al., Constitution and crystallography of thin thermal-oxide layers on epsilon-Fe2Ni1-x: A HREM investigation, OXID METAL, 53(1-2), 2000, pp. 221-240
Authors:
Haemers, TAM
Rickerby, DG
Lanza, F
Geiger, F
Mittemeijer, EJ
Citation: Tam. Haemers et al., Hardfacing of stainless steel with laser melted colmonoy, J MATER SCI, 35(22), 2000, pp. 5691-5698
Authors:
Kamminga, JD
de Keijser, TH
Delhez, R
Mittemeijer, EJ
Citation: Jd. Kamminga et al., On the origin of stress in magnetron sputtered TiN layers, J APPL PHYS, 88(11), 2000, pp. 6332-6345
Authors:
Kamminga, JD
de Keijser, TH
Mittemeijer, EJ
Delhez, R
Citation: Jd. Kamminga et al., New methods for diffraction stress measurement: a critical evaluation of new and existing methods, J APPL CRYS, 33, 2000, pp. 1059-1066
Authors:
Velterop, L
Delhez, R
de Keijser, TH
Mittemeijer, EJ
Reefman, D
Citation: L. Velterop et al., X-ray diffraction analysis of stacking and twin faults in f.c.c. metals: arevision and allowance for texture and non-uniform fault probabilities, J APPL CRYS, 33, 2000, pp. 296-306
Authors:
Kamminga, JD
Delhez, R
de Keijser, TH
Mittemeijer, EJ
Citation: Jd. Kamminga et al., A tool for X-ray diffraction analysis of thin layers on substrates: substrate peak removal method, J APPL CRYS, 33, 2000, pp. 108-111
Authors:
Voskamp, AP
Mittemeijer, EJ
Citation: Ap. Voskamp et Ej. Mittemeijer, Residual stress development and texture formation during rolling contact loading, INDUSTRIAL APPLICATIONS OF X-RAY DIFFRACTION, 2000, pp. 813-846
Authors:
Mittemeijer, EJ
Biglari, MH
Bottger, AJ
van der Pers, NM
Sloof, WG
Tichelaar, FD
Citation: Ej. Mittemeijer et al., Amorphous precipitates in a crystalline matrix; Precipitation of amorphousSi3N4 in alpha-Fe, SCR MATER, 41(6), 1999, pp. 625-630
Authors:
Pekelharing, MI
Bottger, AJ
Somers, MAJ
Mittemeijer, EJ
Citation: Mi. Pekelharing et al., Application of the cluster variation method to ordering in an interstitialsolid solution: the gamma-Fe[N]/gamma '-Fe4N1-x equilibrium, MET MAT T A, 30(8), 1999, pp. 1945-1953
Authors:
Haemers, TAM
Rickerby, DG
Mittemeijer, EJ
Citation: Tam. Haemers et al., Simulation of solidification structures of binary alloys: a multi-particlediffusion-limited aggregation model with surface rearrangement, MODEL SIM M, 7(2), 1999, pp. 233-252
Authors:
Jeurgens, LPH
Sloof, WG
Tichelaar, FD
Borsboom, CG
Mittemeijer, EJ
Citation: Lph. Jeurgens et al., Determination of thickness and composition of aluminium-oxide overlayers on aluminium substrates, APPL SURF S, 145, 1999, pp. 11-15
Authors:
Schollhammer, J
Chang, LS
Rabkin, E
Baretzky, B
Gust, W
Mittemeijer, EJ
Citation: J. Schollhammer et al., Measurement of the profile and the dihedral angle of grain boundary grooves by atomic force microscopy, Z METALLKUN, 90(9), 1999, pp. 687-690
Authors:
Graat, PCJ
Somers, MAJ
Mittemeijer, EJ
Citation: Pcj. Graat et al., The initial oxidation of epsilon-Fe2N1-x: growth kinetics, THIN SOL FI, 353(1-2), 1999, pp. 72-78
Authors:
Benedictus, R
Traeholt, C
Bottger, A
Mittemeijer, EJ
Citation: R. Benedictus et al., Solid state amorphization in the Co-Ti system, THIN SOL FI, 345(2), 1999, pp. 319-329
Authors:
Graat, PCJ
Somers, MAJ
Mittemeijer, EJ
Citation: Pcj. Graat et al., Ellipsometric analysis of the oxidation of alpha-Fe and epsilon-Fe2N1-x, THIN SOL FI, 340(1-2), 1999, pp. 87-94
Authors:
van Leeuwen, M
Kamminga, JD
Mittemeijer, EJ
Citation: M. Van Leeuwen et al., Diffraction stress analysis of thin films: Modeling and experimental evaluation of elastic constants and grain interaction, J APPL PHYS, 86(4), 1999, pp. 1904-1914