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Citation: As. Helmy et al., Control of silica cap properties by oxygen plasma treatment for single-capselective impurity free vacancy disordering, APPL PHYS L, 74(5), 1999, pp. 732-734

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Citation: Lg. Deng et al., Can dry-etching systems be designed for low damage ab initio?, J VAC SCI B, 16(6), 1998, pp. 3334-3338

Authors: Giaconia, C Torrini, R Murad, SK Wilkinson, CDW

Citation: C. Giaconia et al., Artificial dielectric optical structures: A challenge for nanofabrication, J VAC SCI B, 16(6), 1998, pp. 3903-3905