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Results: 1-13 |
Results: 13
COMPOSITION CENTRAL BY CURRENT MODULATION IN DC-REACTIVE SPUTTERING
Authors: NYBERG T NENDER C BERG S
Citation: T. Nyberg et al., COMPOSITION CENTRAL BY CURRENT MODULATION IN DC-REACTIVE SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1868-1872
COMPUTER MODELING AS A TOOL TO PREDICT DEPOSITION RATE AND FILM COMPOSITION IN THE REACTIVE SPUTTERING PROCESS
Authors: BERG S NYBERG T BLOM HO NENDER C
Citation: S. Berg et al., COMPUTER MODELING AS A TOOL TO PREDICT DEPOSITION RATE AND FILM COMPOSITION IN THE REACTIVE SPUTTERING PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1277-1285
STUDIES OF REACTIVE SPUTTERING OF MULTIPHASE CHROMIUM NITRIDE
Authors: NYBERG T SKYTT P GALNANDER B NENDER C NORDGREN J BERG S
Citation: T. Nyberg et al., STUDIES OF REACTIVE SPUTTERING OF MULTIPHASE CHROMIUM NITRIDE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(2), 1997, pp. 248-252
IN-SITU DIAGNOSTIC STUDIES OF REACTIVE COSPUTTERING FROM 2 TARGETS BYMEANS OF SOFT-X-RAY AND OPTICAL-EMISSION SPECTROSCOPY
Authors: NYBERG T SKYTT P GALNANDER B NENDER C NORDGREN J BERG S
Citation: T. Nyberg et al., IN-SITU DIAGNOSTIC STUDIES OF REACTIVE COSPUTTERING FROM 2 TARGETS BYMEANS OF SOFT-X-RAY AND OPTICAL-EMISSION SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(1), 1997, pp. 145-148
THE INFLUENCE OF THE DEPOSITION ANGLE ON THE COMPOSITION OF REACTIVELY SPUTTERED THIN-FILMS
Authors: NYBERG T NENDER C HOGBERG H BERG S
Citation: T. Nyberg et al., THE INFLUENCE OF THE DEPOSITION ANGLE ON THE COMPOSITION OF REACTIVELY SPUTTERED THIN-FILMS, Surface & coatings technology, 94-5(1-3), 1997, pp. 242-246
LINEAR ARC-DISCHARGE (LAD) - A NEW-TYPE OF HOLLOW-CATHODE PLASMA SOURCE
Authors: BARANKOVA H BARDOS L NENDER C BERG S
Citation: H. Barankova et al., LINEAR ARC-DISCHARGE (LAD) - A NEW-TYPE OF HOLLOW-CATHODE PLASMA SOURCE, Surface & coatings technology, 87-8(1-3), 1996, pp. 377-380
MODELING OF MASS-TRANSPORT AND GAS KINETICS OF THE REACTIVE SPUTTERING PROCESS
Authors: BERG S NENDER C
Citation: S. Berg et C. Nender, MODELING OF MASS-TRANSPORT AND GAS KINETICS OF THE REACTIVE SPUTTERING PROCESS, Journal de physique. IV, 5(C5), 1995, pp. 45-54
MODELING OF MASS-TRANSPORT AND GAS KINETICS OF THE REACTIVE SPUTTERING PROCESS
Authors: BERG S NENDER C
Citation: S. Berg et C. Nender, MODELING OF MASS-TRANSPORT AND GAS KINETICS OF THE REACTIVE SPUTTERING PROCESS, Journal de physique. IV, 5(C5), 1995, pp. 45-54
HYSTERESIS EFFECTS IN THE SPUTTERING PROCESS USING 2 REACTIVE GASES
Authors: BARANKOVA H BERG S CARLSSON P NENDER C
Citation: H. Barankova et al., HYSTERESIS EFFECTS IN THE SPUTTERING PROCESS USING 2 REACTIVE GASES, Thin solid films, 260(2), 1995, pp. 181-186
NUMERICAL AND EXPERIMENTAL STUDIES OF THE SPUTTER YIELD AMPLIFICATIONEFFECT
Authors: NENDER C KATARDJIEV IV BIERSACK JP BERG S BARKLUND AM
Citation: C. Nender et al., NUMERICAL AND EXPERIMENTAL STUDIES OF THE SPUTTER YIELD AMPLIFICATIONEFFECT, Radiation effects and defects in solids, 130, 1994, pp. 281-291
THE STEADY-STATE IN NET EROSION AND NET GROWTH REGIMES DURING SIMULTANEOUS ION-BOMBARDMENT AND ATOMIC DEPOSITION PROCESSES
Authors: KATARDJIEV IV CARTER G NOBES MJ BERG S NENDER C
Citation: Iv. Katardjiev et al., THE STEADY-STATE IN NET EROSION AND NET GROWTH REGIMES DURING SIMULTANEOUS ION-BOMBARDMENT AND ATOMIC DEPOSITION PROCESSES, Radiation effects and defects in solids, 129(3-4), 1994, pp. 315-333
LARGE-AREA SELECTIVE THIN-FILM DEPOSITION BY BIAS SPUTTERING
Authors: BERG S KATARDJIEV IV NENDER C CARLSSON P
Citation: S. Berg et al., LARGE-AREA SELECTIVE THIN-FILM DEPOSITION BY BIAS SPUTTERING, Thin solid films, 241(1-2), 1994, pp. 1-8
HIGH BIAS SPUTTERING FOR LARGE-AREA SELECTIVE DEPOSITION
Authors: NENDER C KATARDJIEV IV BARKLUND AM BERG S CARLSSON P
Citation: C. Nender et al., HIGH BIAS SPUTTERING FOR LARGE-AREA SELECTIVE DEPOSITION, Thin solid films, 228(1-2), 1993, pp. 87-90
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