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Results:
1-9
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Results: 9
Authors:
Ye, C
Ning, ZY
Cheng, SH
Kang, J
Citation: C. Ye et al., Study on alpha-C : F films deposited by electron cyclotron resonance plasma chemical vapor deposition, ACT PHY C E, 50(4), 2001, pp. 784-789
Authors:
Ning, ZY
Cheng, SH
Ye, C
Citation: Zy. Ning et al., Chemical bonding structure of fluorinated amorphous carbon films prepared by electron cyclotron resonance plasma chemical vapor deposition, ACT PHY C E, 50(3), 2001, pp. 566-571
Authors:
Ye, C
Ning, ZY
Cheng, SH
Citation: C. Ye et al., Optical properties of amorphous fluorinated carbon films prepared by electron cyclotron resonance plasma, ACT PHY C E, 50(10), 2001, pp. 2017-2022
Authors:
Wu, XM
Dong, YM
Zhuge, LJ
Ye, CN
Tang, NY
Ning, ZY
Yao, WG
Yu, YH
Citation: Xm. Wu et al., Room-temperature visible electroluminescence of Al-doped silicon oxide films, APPL PHYS L, 78(26), 2001, pp. 4121-4123
Authors:
Cheng, SH
Ning, ZY
Kan, J
Ma, CL
Ye, C
Citation: Sh. Cheng et al., Effects of deposition temperature on electrical properties of hydrogenatedamorphous carbon films, ACT PHY C E, 49(10), 2000, pp. 2041-2046
Authors:
Chen, XH
Ning, ZY
Hess, DW
Tolbert, LM
Citation: Xh. Chen et al., Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition, J VAC SCI A, 18(1), 2000, pp. 68-73
Authors:
Xu, QA
Shen, MR
Ning, ZY
Zhu, JS
Citation: Qa. Xu et al., Deposition of CNx thin films by electrolysis of organic solution, ACT PHY C E, 48(7), 1999, pp. 1292-1296
Authors:
Ning, ZY
Cheng, SH
Citation: Zy. Ning et Sh. Cheng, Etching properties of amorphous hydrogenated carbon films in a multipole electron cyclotron resonance oxygen plasma system, ACT PHY C E, 48(10), 1999, pp. 1950-1956
Authors:
Xu, Q
Ning, ZY
Shen, MR
Xin, Y
Zhao, B
Zhu, JS
Citation: Q. Xu et al., CNx films deposition by organic solution electrolysis, SURF COAT, 122(2-3), 1999, pp. 188-190
Risultati:
1-9
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