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Citation: Fc. Schilling et al., NMR CHARACTERIZATION OF DOPED SIO2-FILMS USED IN INTEGRATED-CIRCUITS, Journal of applied physics, 78(6), 1995, pp. 4174-4182

Authors: SCHILLING FC STEINER KG OBENG YS

Citation: Fc. Schilling et al., NMR CHARACTERIZATION OF DOPED SIO2 USED IN INTEGRATED-CIRCUITS, Journal of applied physics, 78(2), 1995, pp. 1303-1311

Authors: OBENG YS BRADY DC VITKAVAGE SC TAYLOR JA HANSON KJ SAPJETA BJ

Citation: Ys. Obeng et al., PITTING OF THE SILICON LAYER OF POLY BUFFERED LOCOS STACK, Journal of the Electrochemical Society, 142(5), 1995, pp. 1680-1688

Authors: OBENG YS STEINER KG VELAGA AN PAI CS

Citation: Ys. Obeng et al., DIELECTRIC MATERIALS FOR ADVANCED VLSI AND ULSI TECHNOLOGIES, AT&T technical journal, 73(3), 1994, pp. 94-111