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Results:
1-7
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Results: 7
Authors:
CARTER DJD
PEPIN A
SCHWEIZER MR
SMITH HI
OCOLA LE
Citation: Djd. Carter et al., DIRECT MEASUREMENT OF THE EFFECT OF SUBSTRATE PHOTOELECTRONS IN X-RAYNANOLITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2509-2513
Authors:
OCOLA LE
CERRINA F
MAY T
Citation: Le. Ocola et al., LATENT IMAGE CHARACTERIZATION OF POSTEXPOSURE BAKE PROCESS IN CHEMICALLY AMPLIFIED RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2545-2549
Authors:
OCOLA LE
CERRINA F
MAY T
Citation: Le. Ocola et al., SYNCHROTRON-RADIATION MICRO-FOURIER TRANSFORM-INFRARED SPECTROSCOPY APPLIED TO PHOTORESIST IMAGING, Applied physics letters, 71(6), 1997, pp. 847-849
Authors:
OCOLA LE
FRYER D
NEALEY P
DEPABLO J
CERRINA F
KAMMER S
Citation: Le. Ocola et al., LATENT IMAGE-FORMATION - NANOSCALE TOPOGRAPHY AND CALORIMETRIC MEASUREMENTS IN CHEMICALLY AMPLIFIED RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3974-3979
Authors:
OCOLA LE
FRYER DS
REYNOLDS G
KRASNOPEROVA A
CERRINA F
Citation: Le. Ocola et al., SCANNING FORCE MICROSCOPY MEASUREMENTS OF LATENT IMAGE TOPOGRAPHY IN CHEMICALLY AMPLIFIED RESISTS, Applied physics letters, 68(5), 1996, pp. 717-719
Authors:
OCOLA LE
CERRINA F
Citation: Le. Ocola et F. Cerrina, PARAMETRIC MODELING AT RESIST-SUBSTRATE INTERFACES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3986-3989
Authors:
OCOLA LE
CERRINA F
Citation: Le. Ocola et F. Cerrina, PARAMETRIC MODELING OF PHOTOELECTRON EFFECTS IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2839-2844
Risultati:
1-7
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