Authors:
OTT AW
KLAUS JW
JOHNSON JM
GEORGE SM
MCCARLEY KC
WAY JD
Citation: Aw. Ott et al., MODIFICATION OF POROUS ALUMINA MEMBRANES USING AL2O3 ATOMIC LAYER CONTROLLED DEPOSITION, Chemistry of materials, 9(3), 1997, pp. 707-714
Citation: Aw. Ott et al., SURFACE-CHEMISTRY OF IN2O3 DEPOSITION USING IN(CH3)(3) AND H2O IN A BINARY REACTION SEQUENCE, Applied surface science, 112, 1997, pp. 205-215
Citation: Jw. Klaus et al., ATOMIC LAYER CONTROLLED GROWTH OF SIO2-FILMS USING BINARY REACTION SEQUENCE CHEMISTRY, Applied physics letters, 70(9), 1997, pp. 1092-1094
Authors:
OTT AW
MCCARLEY KC
KLAUS JW
WAY JD
GEORGE SM
Citation: Aw. Ott et al., ATOMIC LAYER CONTROLLED DEPOSITION OF AL2O3 FILMS USING BINARY REACTION SEQUENCE CHEMISTRY, Applied surface science, 107, 1996, pp. 128-136
Citation: O. Sneh et al., ATOMIC LAYER GROWTH OF SIO2 ON SI(100) USING SICL4 AND H2O IN A BINARY REACTION SEQUENCE, Surface science, 334(1-3), 1995, pp. 135-152
Citation: Ac. Dillon et al., SURFACE-CHEMISTRY OF AL2O3 DEPOSITION USING AL(CH3)(3) AND H2O IN A BINARY REACTION SEQUENCE, Surface science, 322(1-3), 1995, pp. 230-242
Authors:
GEORGE SM
SNEH O
DILLON AC
WISE ML
OTT AW
OKADA LA
WAY JD
Citation: Sm. George et al., ATOMIC LAYER CONTROLLED DEPOSITION OF SIO2 AND AL2O3 USING ABAB - BINARY REACTION SEQUENCE CHEMISTRY, Applied surface science, 82-3, 1994, pp. 460-467