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Authors: SCHILTZ A TERPAN JF AMBLARD G PANIEZ PJ

Citation: A. Schiltz et al., BOTTOM ANTIREFLECTIVE COATINGS FOR DUV LITHOGRAPHY - DETERMINATION OFOPTIMUM THERMAL-PROCESS CONDITIONS, Microelectronic engineering, 35(1-4), 1997, pp. 221-224

Authors: PAIN L LECORNEC C ROSILIO C PANIEZ PJ

Citation: L. Pain et al., FREE-VOLUME EFFECTS IN CHEMICALLY AMPLIFIED DUV POSITIVE RESISTS, Microelectronic engineering, 30(1-4), 1996, pp. 271-274

Authors: SCHILTZ A TERPAN JF BRUN S PANIEZ PJ

Citation: A. Schiltz et al., BOTTOM ANTIREFLECTIVE COATINGS - CONTROL OF THERMAL-PROCESSING, Microelectronic engineering, 30(1-4), 1996, pp. 283-286

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Authors: SCHILTZ A PANIEZ PJ

Citation: A. Schiltz et Pj. Paniez, IN-SITU DETERMINATION OF PHOTORESIST GLASS-TRANSITION TEMPERATURE BY WAFER CURVATURE MEASUREMENT TECHNIQUES, Microelectronic engineering, 27(1-4), 1995, pp. 413-416