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Results:
1-8
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Results: 8
Authors:
PECCOUD L
BAPTIST R
Citation: L. Peccoud et R. Baptist, UNTITLED, Le Vide, 52(282), 1996, pp. 439-440
Authors:
MOREAU D
BAPTIST R
PECCOUD L
Citation: D. Moreau et al., SILICON MICROTIP FABRICATION TECHNIQUES, Le Vide, 52(282), 1996, pp. 463
Authors:
FRANCOU M
DANEL JS
PECCOUD L
Citation: M. Francou et al., DEEP AND FAST PLASMA-ETCHING FOR SILICON MICROMACHINING, Sensors and actuators. A, Physical, 46(1-3), 1995, pp. 17-21
Authors:
ACHARD H
MACE H
PECCOUD L
Citation: H. Achard et al., DEVICE PROCESSING AND INTEGRATION OF FERROELECTRIC THIN-FILMS FOR MEMORY APPLICATIONS, Microelectronic engineering, 29(1-4), 1995, pp. 19-28
Authors:
MACE H
ACHARD H
PECCOUD L
Citation: H. Mace et al., REACTIVE ION ETCHING OF PT PZT/PT FERROELECTRIC THIN-FILM CAPACITORS IN HIGH-DENSITY DECR PLASMA/, Microelectronic engineering, 29(1-4), 1995, pp. 45-48
Authors:
DELPUPPO H
DESMAISON J
PECCOUD L
Citation: H. Delpuppo et al., A COMPARATIVE-STUDY OF O2 SIH4 AND N2O/SIH4 MIXTURES FOR SIO2 DEPOSITION IN A MICROWAVE AFTERGLOW/, Journal de physique. IV, 3(C3), 1993, pp. 241-246
Authors:
DAVIET JF
PECCOUD L
MONDON F
Citation: Jf. Daviet et al., ELECTROSTATIC CLAMPING APPLIED TO SEMICONDUCTOR PLASMA PROCESSING .1.THEORETICAL MODELING, Journal of the Electrochemical Society, 140(11), 1993, pp. 3245-3256
Authors:
DAVIET JF
PECCOUD L
MONDON F
Citation: Jf. Daviet et al., ELECTROSTATIC CLAMPING APPLIED TO SEMICONDUCTOR PLASMA PROCESSING .2.EXPERIMENTAL RESULTS, Journal of the Electrochemical Society, 140(11), 1993, pp. 3256-3261
Risultati:
1-8
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