Authors:
LAU WS
CHAN DSH
PHANG JCH
CHOW KW
PEY KS
LIM YP
SANE V
CRONQUIST B
Citation: Ws. Lau et al., QUANTITATIVE IMAGING OF LOCAL DEFECTS IN VERY THIN SILICON DIOXIDE FILMS AT LOW-BIAS VOLTAGE BY TRUE OXIDE ELECTRON-BEAM-INDUCED CURRENT, Journal of applied physics, 77(2), 1995, pp. 739-746
Citation: Ws. Lau et al., 2 TYPES OF LOCAL OXIDE SUBSTRATE DEFECTS IN VERY THIN SILICON DIOXIDEFILMS ON SILICON/, Applied physics letters, 67(19), 1995, pp. 2854-2856
Authors:
LAU WS
CHAN DSH
PHANG JCH
CHOW KW
PEY KS
LIM YP
CRONQUIST B
Citation: Ws. Lau et al., TRUE OXIDE ELECTRON-BEAM-INDUCED CURRENT FOR LOW-VOLTAGE IMAGING OF LOCAL DEFECTS IN VERY THIN SILICON DIOXIDE FILMS, Applied physics letters, 63(16), 1993, pp. 2240-2242