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Authors: LAU WS CHAN DSH PHANG JCH CHOW KW PEY KS LIM YP SANE V CRONQUIST B
Citation: Ws. Lau et al., QUANTITATIVE IMAGING OF LOCAL DEFECTS IN VERY THIN SILICON DIOXIDE FILMS AT LOW-BIAS VOLTAGE BY TRUE OXIDE ELECTRON-BEAM-INDUCED CURRENT, Journal of applied physics, 77(2), 1995, pp. 739-746

Authors: LAU WS SANE V PEY KS CRONQUIST B
Citation: Ws. Lau et al., 2 TYPES OF LOCAL OXIDE SUBSTRATE DEFECTS IN VERY THIN SILICON DIOXIDEFILMS ON SILICON/, Applied physics letters, 67(19), 1995, pp. 2854-2856

Authors: LAU WS CHAN DSH PHANG JCH CHOW KW PEY KS LIM YP CRONQUIST B
Citation: Ws. Lau et al., TRUE OXIDE ELECTRON-BEAM-INDUCED CURRENT FOR LOW-VOLTAGE IMAGING OF LOCAL DEFECTS IN VERY THIN SILICON DIOXIDE FILMS, Applied physics letters, 63(16), 1993, pp. 2240-2242
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