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Results: 1-25/39
Authors:
BORGES CFM
PFENDER E
HEBERLEIN J
ANDERSON CVDR
Citation: Cfm. Borges et al., ADHESION IMPROVEMENT OF DIAMOND FILMS ON MOLYBDENUM ROD SUBSTRATES USING METALLIC POWDER, DIAMOND AND RELATED MATERIALS, 7(9), 1998, pp. 1351-1356
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
Citation: D. Kolman et al., INFLUENCE OF DEPOSITION PARAMETERS ON DIAMOND THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION, DIAMOND AND RELATED MATERIALS, 7(6), 1998, pp. 794-801
Authors:
BORGES CFM
ASMANN M
PFENDER E
HEBERLEIN J
Citation: Cfm. Borges et al., DIAMOND DEPOSITION ON SUBSTRATES WITH DIFFERENT GEOMETRIES IN A THERMAL PLASMA REACTOR, Plasma chemistry and plasma processing, 18(2), 1998, pp. 305-324
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
Citation: D. Kolman et al., A 3-DIMENSIONAL 2-PHASE MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION, Plasma chemistry and plasma processing, 18(1), 1998, pp. 73-89
Authors:
WATANABE T
WANG X
PFENDER E
HEBERLEIN J
Citation: T. Watanabe et al., CORRELATIONS BETWEEN ELECTRODE PHENOMENA AND COATING PROPERTIES IN WIRE ARC SPRAYING, Thin solid films, 316(1-2), 1998, pp. 169-173
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., PLASMA-SPRAYED ZRO2 THERMAL BARRIER COATINGS DOPED WITH AN APPROPRIATE AMOUNT OF SIO2, Thin solid films, 315(1-2), 1998, pp. 159-169
Authors:
AMAKAWA T
JENISTA J
HEBERLEIN J
PFENDER E
Citation: T. Amakawa et al., ANODE-BOUNDARY-LAYER BEHAVIOR IN A TRANSFERRED, HIGH-INTENSITY ARC, Journal of physics. D, Applied physics (Print), 31(20), 1998, pp. 2826-2834
Authors:
GEORGE C
CANDLER G
PFENDER E
Citation: C. George et al., AN IMPLICIT ALGORITHM TO SIMULATE REACTION CHEMISTRY IN A PLASMA, Journal of physics. D, Applied physics (Print), 31(18), 1998, pp. 2269-2280
Authors:
TANDIAN NP
PFENDER E
Citation: Np. Tandian et E. Pfender, HEAT-TRANSFER IN RF PLASMA SINTERING - MODELING AND EXPERIMENTS, Plasma chemistry and plasma processing, 17(3), 1997, pp. 353-370
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., IMPROVEMENT OF PLASMA SPRAYING EFFICIENCY AND COATING QUALITY, Plasma chemistry and plasma processing, 17(1), 1997, pp. 93-105
Authors:
FANG MTC
PFENDER E
Citation: Mtc. Fang et E. Pfender, SPECIAL ISSUE ON HIGH-PRESSURE ARCS AND HIGH-FREQUENCY THERMAL PLASMAS - GUEST EDITORIAL, IEEE transactions on plasma science, 25(5), 1997, pp. 807-808
Authors:
COLLARES MP
PFENDER E
Citation: Mp. Collares et E. Pfender, EFFECT OF CURRENT CONNECTION TO THE ANODE NOZZLE ON PLASMA TORCH EFFICIENCY, IEEE transactions on plasma science, 25(5), 1997, pp. 864-871
Authors:
JENISTA J
HEBERLEIN JVR
PFENDER E
Citation: J. Jenista et al., NUMERICAL-MODEL OF THE ANODE REGION OF HIGH-CURRENT ELECTRIC-ARCS, IEEE transactions on plasma science, 25(5), 1997, pp. 883-890
Authors:
OR DT
SUBRAMANIAN NS
HEBERLEIN JVR
PFENDER E
Citation: Dt. Or et al., MODELING OF HIGH-PRESSURE, HIGH-FREQUENCY (RF) OXYGEN PLASMAS, IEEE transactions on plasma science, 25(5), 1997, pp. 1034-1041
Authors:
CHEN HC
HEBERLEIN J
PFENDER E
Citation: Hc. Chen et al., TEM CHARACTERIZATION OF PLASMA-SPRAYED THERMAL BARRIER COATINGS AND CERAMIC-METAL INTERFACES AFTER HOT ISOSTATIC PRESSING, Thin solid films, 301(1-2), 1997, pp. 105-114
Authors:
CHEN HC
PFENDER E
HEBERLEIN J
Citation: Hc. Chen et al., STRUCTURAL-CHANGES IN PLASMA-SPRAYED ZRO2 COATINGS AFTER HOT ISOSTATIC PRESSING, Thin solid films, 293(1-2), 1997, pp. 227-235
Authors:
CHANG CH
PFENDER E
Citation: Ch. Chang et E. Pfender, ADVANCES IN THE COMPUTATIONAL MODELING OF THERMAL-PLASMA PROCESSING, JOM, 48(6), 1996, pp. 46-48
Authors:
BAHR DF
BUCCI DV
SCHADLER LS
LAST JA
HEBERLEIN J
PFENDER E
GERBERICH WW
Citation: Df. Bahr et al., CHARACTERIZATION OF DCJET CVD DIAMOND FILMS ON MOLYBDENUM, DIAMOND AND RELATED MATERIALS, 5(12), 1996, pp. 1462-1472
Authors:
BOULOS M
PFENDER E
Citation: M. Boulos et E. Pfender, MATERIALS PROCESSING WITH THERMAL PLASMAS, MRS bulletin, 21(8), 1996, pp. 65-68
Authors:
CHEN WLT
HEBERLEIN J
PFENDER E
Citation: Wlt. Chen et al., CRITICAL ANALYSIS OF VISCOSITY DATA OF THERMAL ARGON PLASMAS AT ATMOSPHERIC-PRESSURE, Plasma chemistry and plasma processing, 16(4), 1996, pp. 635-650
Authors:
GEORGE C
CANDLER G
YOUNG R
PFENDER E
HEBERLEIN J
Citation: C. George et al., NOZZLE OPTIMIZATION FOR DISSOCIATED SPECIES TRANSPORT IN LOW-PRESSUREPLASMA CHEMICAL-VAPOR-DEPOSITION, Plasma chemistry and plasma processing, 16(1), 1996, pp. 43-56
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
YOUNG R
Citation: D. Kolman et al., 2-DIMENSIONAL MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION, Plasma chemistry and plasma processing, 16(1), 1996, pp. 57-69
Authors:
MENART J
HEBERLEIN J
PFENDER E
Citation: J. Menart et al., THEORETICAL RADIATIVE EMISSION RESULTS FOR ARGON COPPER THERMAL PLASMAS/, Plasma chemistry and plasma processing, 16(1), 1996, pp. 245-265
Authors:
CHEN HC
PFENDER E
Citation: Hc. Chen et E. Pfender, MICROSTRUCTURE OF PLASMA-SPRAYED NI-AL ALLOY COATING ON MILD-STEEL, Thin solid films, 280(1-2), 1996, pp. 188-198
Authors:
MENART J
HEBERLEIN J
PFENDER E
Citation: J. Menart et al., LINE-BY-LINE METHOD OF CALCULATING EMISSION COEFFICIENTS FOR THERMAL PLASMAS CONSISTING OF MONATOMIC SPECIES, Journal of quantitative spectroscopy & radiative transfer, 56(3), 1996, pp. 377-398