AAAAAA
Results:
1-7
|
Results: 7
Authors:
Pasini, D
Klopp, JM
Frechet, JMJ
Citation: D. Pasini et al., Design, synthesis, and characterization of carbon-rich cyclopolymers for 193 nm microlithography, CHEM MATER, 13(11), 2001, pp. 4136-4146
Authors:
Klopp, JM
Pasini, D
Byers, JD
Willson, CG
Frechet, JMJ
Citation: Jm. Klopp et al., Microlithographic assessment of a novel family of transparent and etch-resistant chemically amplified 193-nm resists eased on cyclopolymers, CHEM MATER, 13(11), 2001, pp. 4147-4153
Authors:
Horattas, MC
Trupiano, J
Hopkins, S
Pasini, D
Martino, C
Murty, A
Citation: Mc. Horattas et al., Changing concepts in long-term central venous access: Catheter selection and cost savings, AM J INFECT, 29(1), 2001, pp. 32-40
Authors:
Pasini, D
Low, E
Frechet, JMJ
Citation: D. Pasini et al., Novel design of carbon-rich polymers for 193 nm microlithography: Adamantane-containing cyclopolymers, ADVAN MATER, 12(5), 2000, pp. 347
Authors:
Ashton, PR
Heiss, AM
Pasini, D
Raymo, FM
Shipway, AN
Stoddart, JF
Spencer, N
Citation: Pr. Ashton et al., Molecular meccano, 51 - Diastereoselective self-assembly of [2]catenanes, EUR J ORG C, (5), 1999, pp. 995-1004
Authors:
Meagley, RP
Pasini, D
Park, LY
Frechet, JMJ
Citation: Rp. Meagley et al., Unique polymers via radical diene cyclization: polyspironorbornanes and their application to 193 nm microlithography, CHEM COMMUN, (16), 1999, pp. 1587-1588
Authors:
Havard, JM
Yoshida, M
Pasini, D
Vladimirov, N
Frechet, JMJ
Medeiros, DR
Patterson, K
Yamada, S
Willson, CG
Byers, JD
Citation: Jm. Havard et al., Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline), J POL SC PC, 37(9), 1999, pp. 1225-1236
Risultati:
1-7
|