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Results: 1-11 |
Results: 11
Prospect for high brightness III-nitride electron emitter
Authors: Machuca, F Sun, Y Liu, Z Ioakeimidi, K Pianetta, P Pease, RFW
Citation: F. Machuca et al., Prospect for high brightness III-nitride electron emitter, J VAC SCI B, 18(6), 2000, pp. 3042-3046
High-throughput, high-spatial-frequency measurement of critical dimension variations using memory circuits as electrical test structures
Authors: Ouyang, X Deeter, TL Berglund, CN McCord, MA Pease, RFW
Citation: X. Ouyang et al., High-throughput, high-spatial-frequency measurement of critical dimension variations using memory circuits as electrical test structures, J VAC SCI B, 17(6), 1999, pp. 2707-2713
Space-charge-induced aberrations
Authors: Winograd, GI Meisburger, WD Pease, RFW
Citation: Gi. Winograd et al., Space-charge-induced aberrations, J VAC SCI B, 17(6), 1999, pp. 2803-2807
Field size versus column shortness in high throughput electron beam lithography
Authors: Han, L Pease, RFW Meisburger, WD Winograd, GI McCord, MA
Citation: L. Han et al., Field size versus column shortness in high throughput electron beam lithography, J VAC SCI B, 17(6), 1999, pp. 2830-2835
Charging and discharging of electron beam resist films
Authors: Bai, M Pease, RFW Tanasa, C McCord, MA Pickard, DS Meisburger, D
Citation: M. Bai et al., Charging and discharging of electron beam resist films, J VAC SCI B, 17(6), 1999, pp. 2893-2896
Maskless extreme ultraviolet lithography
Authors: Choksi, N Pickard, DS McCord, M Pease, RFW Shroff, Y Chen, YJ Oldham, W Markle, D
Citation: N. Choksi et al., Maskless extreme ultraviolet lithography, J VAC SCI B, 17(6), 1999, pp. 3047-3051
Multiplexed blanker array for parallel electron beam lithography
Authors: Winograd, GI Han, L McCord, MA Pease, RFW Krishnamurthi, V
Citation: Gi. Winograd et al., Multiplexed blanker array for parallel electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3174-3176
Patterned negative electron affinity photocathodes for maskless electron beam lithography
Authors: Schneider, JE Sen, P Pickard, DS Winograd, GI McCord, MA Pease, RFW Spicer, WE Baum, AW Costello, KA Davis, GA
Citation: Je. Schneider et al., Patterned negative electron affinity photocathodes for maskless electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3192-3196
Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling
Authors: Han, LQ McCord, MA Winograd, GI Pease, RFW
Citation: Lq. Han et al., Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling, J VAC SCI B, 16(6), 1998, pp. 3215-3220
Performance of adaptive alignment method on asymmetric signals
Authors: Chen, X Ghazanfarian, AA McCord, MA Pease, RFW
Citation: X. Chen et al., Performance of adaptive alignment method on asymmetric signals, J VAC SCI B, 16(6), 1998, pp. 3637-3641
Economical sampling algorithm using Fourier analysis for mapping wafer critical dimension variations
Authors: Xu, OY Berglund, CN McCord, MA Pease, RFW Spence, C Liu, HY
Citation: Oy. Xu et al., Economical sampling algorithm using Fourier analysis for mapping wafer critical dimension variations, J VAC SCI B, 16(6), 1998, pp. 3655-3660
Risultati: 1-11 |