Authors:
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Carta, G
Cavinato, G
Gerbasi, R
Porchia, M
Rossetto, G
Citation: Ga. Battiston et al., MOCVD of Al2O3 films using new dialkylaluminum acetylacetonate precursors:Growth kinetics and process yields, CHEM VAPOR, 7(2), 2001, pp. 69-74
Authors:
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Porchia, M
Bandoli, G
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Citation: F. Tisato et al., Technetium and rhenium heterocomplexes containing the diphenylphosphinoferrocenyl fragment, J ORGMET CH, 637, 2001, pp. 772-776
Authors:
Bolzati, C
Porchia, M
Bandoli, G
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Citation: C. Bolzati et al., Oxo-rhenium(V) mixed-ligand complexes with bidentate functionalized phosphines and tridentate Schiff base ligands, INORG CHIM, 315(2), 2001, pp. 205-212
Authors:
Battiston, GA
Gerbasi, R
Gregori, A
Porchia, M
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Citation: Ga. Battiston et al., PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition, THIN SOL FI, 371(1-2), 2000, pp. 126-131
Authors:
Battiston, GA
Carta, G
Gerbasi, R
Porchia, M
Rizzo, L
Rossetto, G
Citation: Ga. Battiston et al., Gas-phase FT-IR analysis and growth kinetics of Al2O3 in a LP-MOCVD reactor using new dialkylacetylacetonate precursors, J PHYS IV, 9(P8), 1999, pp. 675-681
Authors:
Bolzati, C
Malago, E
Boschi, A
Cagnolini, A
Porchia, M
Bandoli, G
Citation: C. Bolzati et al., Symmetric bis-substituted and asymmetric mono-substituted nitridotechnetium complexes with heterofunctionalized phosphinothiolate ligands, NEW J CHEM, 23(8), 1999, pp. 807-809
Authors:
Battiston, GA
Gerbasi, R
Porchia, M
Rizzo, L
Citation: Ga. Battiston et al., TiO2 coating by atmospheric pressure MOCVD in a conveyor belt furnace for industrial applications, CHEM VAPOR, 5(2), 1999, pp. 73
Authors:
Battiston, GA
Gerbasi, R
Porchia, M
Gasparotto, A
Citation: Ga. Battiston et al., Metal organic CVD of nanostructured composite TiO2-Pt thin films: A kinetic approach, CHEM VAPOR, 5(1), 1999, pp. 13-20