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Results:
1-15
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Results: 15
Authors:
VOORMA HJ
LOUIS E
KOSTER NB
BIJKERK F
ZIJLSTRA T
DEGROOT LEM
ROUSSEEUW BAC
ROMIJN J
VANDERDRIFT EWJM
FRIEDRICH J
Citation: Hj. Voorma et al., FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 293-298
Authors:
VLEEMING BJ
LEENE JLTR
VANDERDRIFT E
ROMIJN J
Citation: Bj. Vleeming et al., DUV-E-BEAM MIX AND MATCH LITHOGRAPHY IN A SINGLE MASK FOR FABRICATINGA MULTITERMINAL SQUID DEVICE, Microelectronic engineering, 30(1-4), 1996, pp. 81-84
Authors:
BIJKERK F
SHMAENOK LA
LOUIS E
VOORMA HJ
KOSTER NB
BRUINEMAN C
BASTIAENSEN RKFJ
VANDERDRIFT EWJM
ROMIJN J
DEGROOT LEM
ROUSSEEUW BAC
ZIJLSTRA T
PLATONOV YY
SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
Authors:
ROMIJN J
VAANDRAGER F
Citation: J. Romijn et F. Vaandrager, A NOTE ON FAIRNESS IN I O AUTOMATA, Information processing letters, 59(5), 1996, pp. 245-250
Authors:
WEBSTER MN
TUINHOUT A
VERBRUGGEN AH
ROMIJN J
RADELAAR S
LOCHEL B
JOS HFF
MOORS PMA
Citation: Mn. Webster et al., FABRICATION OF 100 NM POLYSILICON-EMITTER TRANSISTORS USING E-BEAM LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 91-94
Authors:
KOEK BH
CHISHOLM T
ROMIJN J
VANRUN AJ
Citation: Bh. Koek et al., SUB 20 NM STITCHING AND OVERLAY FOR NANO LITHOGRAPHY APPLICATIONS, JPN J A P 1, 33(12B), 1994, pp. 6971-6975
Authors:
KOEK BH
CHISHOLM T
SOMERS J
DAVEY J
ROMIJN J
VONRUN AJ
Citation: Bh. Koek et al., 100 KV ELECTRON-BEAM LITHOGRAPHY USING A SCHOTTKY FIELD-EMISSION SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3409-3412
Authors:
SOHN LL
ROMIJN J
VANDERDRIFT E
ELION WJ
MOOIJ JE
Citation: Ll. Sohn et al., FABRICATION OF A QUASI-3-DIMENSIONAL JOSEPHSON-JUNCTION ARRAY, Physica. B, Condensed matter, 194, 1994, pp. 125-126
Authors:
KOEK BH
CHISHOLM T
VONRUN AJ
ROMIJN J
DAVEY JP
Citation: Bh. Koek et al., AN ELECTRON-BEAM LITHOGRAPHY TOOL WITH A SCHOTTKY EMITTER FOR WIDE-RANGE APPLICATIONS, Microelectronic engineering, 23(1-4), 1994, pp. 81-84
Authors:
WEBSTER MN
TUINHOUT A
LOCHEL B
VERBRUGGEN AH
ROMIJN J
VANDERDRIFT E
RADELAAR S
JOS HFF
MOORS PMA
Citation: Mn. Webster et al., METALLIZATION OF SUBMICRON MICROWAVE BIPOLAR-TRANSISTORS BY ELECTROPLATING, Microelectronic engineering, 23(1-4), 1994, pp. 441-444
Authors:
RADELAAR S
ROMIJN J
VANDERDRIFT E
Citation: S. Radelaar et al., PROCEEDINGS OF THE INTERNATIONAL-CONFERENCE ON MICROFABRICATION - SEPTEMBER 26-29, 1993 MAASTRICHT, THE NETHERLANDS, Microelectronic engineering, 23(1-4), 1994, pp. 180000007-180000007
Authors:
VANDERZANT HSJ
WEBSTER MN
ROMIJN J
MOOIJ JE
Citation: Hsj. Vanderzant et al., VORTICES IN 2-DIMENSIONAL SUPERCONDUCTING WEAKLY COUPLED WIRE NETWORKS, Physical review. B, Condensed matter, 50(1), 1994, pp. 340-350
Authors:
KOEK BH
CHISHOLM T
DAVEY JP
ROMIJN J
VONRUN AJ
Citation: Bh. Koek et al., A SCHOTTKY-EMITTER ELECTRON SOURCE FOR WIDE-RANGE LITHOGRAPHY APPLICATIONS, JPN J A P 1, 32(12B), 1993, pp. 5982-5987
Authors:
LOUIS E
BIJKERK F
SHMAENOK L
VOORMA HJ
VANDERWIEL MJ
SCHLATMANN R
VERHOEVEN J
VANDERDRIFT EWJM
ROMIJN J
ROUSSEEUW BAC
VOSS F
DESOR R
NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
Authors:
WEBSTER MN
VERBRUGGEN AH
JOS HFF
ROMIJN J
MOORS PMA
RADELAAR S
Citation: Mn. Webster et al., PATTERNING OF A TI PT/AU METALLIZATION FOR SUBMICRON BIPOLAR-TRANSISTORS MADE BY DIRECT WRITE E-BEAM LITHOGRAPHY/, Microelectronic engineering, 21(1-4), 1993, pp. 423-426
Risultati:
1-15
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