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Results: 1-25/79
Authors:
SCHNUPP R
KUHNHOLD R
TEMMEL G
BURTE E
RYSSEL H
Citation: R. Schnupp et al., THIN CARBON-FILMS AS ELECTRODES FOR BIOELECTRONIC APPLICATIONS, Biosensors & bioelectronics, 13(7-8), 1998, pp. 889-894
Authors:
KAL S
KASKO I
RYSSEL H
Citation: S. Kal et al., NONCONTACTING MEASUREMENT OF THICKNESS OF THIN TITANIUM SILICIDE FILMS USING SPECTROSCOPIC ELLIPSOMETER, IEEE electron device letters, 19(4), 1998, pp. 127-130
Authors:
SVORCIK V
ARENHOLZ E
HNATOWICZ V
RYBKA V
OCHSNER R
RYSSEL H
Citation: V. Svorcik et al., AFM SURFACE INVESTIGATION OF POLYETHYLENE MODIFIED BY ION-BOMBARDMENT, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 142(3), 1998, pp. 349-354
Authors:
PARK YK
TAKAI M
NAGAI T
KISHIMOTO T
SEIDL A
LEHRER C
FREY L
RYSSEL H
Citation: Yk. Park et al., MICROANALYSIS OF MASKLESSLY FABRICATED MICROSTRUCTURES USING NUCLEAR MICROPROBE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 138, 1998, pp. 373-378
Authors:
TAKAI M
KISHIMOTO T
MORIMOTO H
PARK YK
LIPP S
LEHRER C
FREY L
RYSSEL H
HOSONO A
KAWABUCHI S
Citation: M. Takai et al., FABRICATION OF FIELD EMITTER ARRAY USING FOCUSED ION AND ELECTRON-BEAM-INDUCED REACTION, Microelectronic engineering, 42, 1998, pp. 453-456
Authors:
PETRIK P
BIRO LP
FRIED M
LOHNER T
BERGER R
SCHNEIDER C
GYULAI J
RYSSEL H
Citation: P. Petrik et al., COMPARATIVE-STUDY OF SURFACE-ROUGHNESS MEASURED ON POLYSILICON USING SPECTROSCOPIC ELLIPSOMETRY AND ATOMIC-FORCE MICROSCOPY, Thin solid films, 315(1-2), 1998, pp. 186-191
Authors:
LOHNER T
KHANH NQ
PETRIK P
BIRO LP
FRIED M
PINTER I
LEHNERT W
FREY L
RYSSEL H
WENTINK DJ
GYULAI J
Citation: T. Lohner et al., SURFACE DISORDER PRODUCTION DURING PLASMA IMMERSION IMPLANTATION, Thin solid films, 313, 1998, pp. 254-258
Authors:
PETRIK P
FRIED M
LOHNER T
BERGER R
BIRO LP
SCHNEIDER C
GYULAI J
RYSSEL H
Citation: P. Petrik et al., COMPARATIVE-STUDY OF POLYSILICON-ON-OXIDE USING SPECTROSCOPIC ELLIPSOMETRY, ATOMIC-FORCE MICROSCOPY, AND TRANSMISSION ELECTRON-MICROSCOPY, Thin solid films, 313, 1998, pp. 259-263
Authors:
LEHNERT W
BERGER R
SCHNEIDER C
PFITZNER L
RYSSEL H
STEHLE JL
PIEL JP
NEUMANN W
Citation: W. Lehnert et al., IN-SITU SPECTROSCOPIC ELLIPSOMETRY FOR ADVANCED PROCESS-CONTROL IN VERTICAL FURNACES, Thin solid films, 313, 1998, pp. 442-445
Authors:
BAR E
LORENZ J
RYSSEL H
Citation: E. Bar et al., EXPERIMENTAL-VERIFICATION OF 3-DIMENSIONAL SIMULATIONS OF LTO LAYER DEPOSITION ON STRUCTURES PREPARED BY ANISOTROPIC WET ETCHING OF SILICON, Microelectronics and reliability, 38(2), 1998, pp. 287-291
Authors:
BAR E
LORENZ J
RYSSEL H
Citation: E. Bar et al., 3-DIMENSIONAL SIMULATION OF LAYER DEPOSITION, Microelectronics, 29(11), 1998, pp. 799-804
Authors:
TREU M
BURTE EP
SCHORNER R
FRIEDRICHS P
STEPHANI D
RYSSEL H
Citation: M. Treu et al., RELIABILITY OF METAL-OXIDE-SEMICONDUCTOR CAPACITORS ON NITROGEN-IMPLANTED 4H-SILICON CARBIDE, Journal of applied physics, 84(5), 1998, pp. 2943-2948
Authors:
LIST S
RYSSEL H
Citation: S. List et H. Ryssel, ATOMISTIC ANALYSIS OF THE VACANCY MECHANISM OF IMPURITY DIFFUSION IN SILICON, Journal of applied physics, 83(12), 1998, pp. 7585-7594
Authors:
LIST S
RYSSEL H
Citation: S. List et H. Ryssel, ATOMISTIC MODELING OF HIGH-CONCENTRATION EFFECTS OF IMPURITY DIFFUSION IN SILICON, Journal of applied physics, 83(12), 1998, pp. 7595-7607
Authors:
PARK YK
TAKAI M
NAGAI T
KISHIMOTO T
LEHRER C
FREY L
RYSSEL H
Citation: Yk. Park et al., MICROANALYSIS OF IMPURITY CONTAMINATION IN MASKLESSLY ETCHED AREA USING FOCUSED ION-BEAM, JPN J A P 1, 36(12B), 1997, pp. 7712-7716
Authors:
MIKOLAJICK T
HAUBLEIN V
RYSSEL H
Citation: T. Mikolajick et al., THE EFFECT OF RANDOM DOPANT FLUCTUATIONS ON THE MINIMUM CHANNEL-LENGTH OF SHORT-CHANNEL MOS-TRANSISTORS, Applied physics A: Materials science & processing, 64(6), 1997, pp. 555-560
Authors:
MIKOLAJICK T
KUHNHOLD R
RYSSEL H
Citation: T. Mikolajick et al., THE PH-SENSING PROPERTIES OF TANTALUM PENTOXIDE FILMS FABRICATED BY METAL-ORGANIC LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION, Sensors and actuators. B, Chemical, 44(1-3), 1997, pp. 262-267
Authors:
PANEVA R
TEMMEL G
BURTE E
RYSSEL H
Citation: R. Paneva et al., MICROMECHANICAL ULTRASONIC LIQUID NEBULIZER, Sensors and actuators. A, Physical, 62(1-3), 1997, pp. 765-767
Authors:
PARK YK
PASZTI F
TAKAI M
TEMMEL G
BUERTE EP
RYSSEL H
WIGET R
KINOMURA A
HORINO Y
FUJII K
Citation: Yk. Park et al., IR AND RH SILICIDE FORMATION INVESTIGATED BY MICROPROBE RBS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 130(1-4), 1997, pp. 728-733
Authors:
BIRO LP
GYULAI J
HAVANCSAK K
DIDYK AY
FREY L
RYSSEL H
Citation: Lp. Biro et al., IN-DEPTH DAMAGE DISTRIBUTION BY SCANNING PROBE METHODS IN TARGETS IRRADIATED WITH 200 MEV IONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 32-37
Authors:
BIRO LP
GYULAI J
HAVANCSAK K
DIDYK AY
BOGEN S
FREY L
RYSSEL H
Citation: Lp. Biro et al., NEW METHOD BASED ON ATOMIC-FORCE MICROSCOPY FOR IN-DEPTH CHARACTERIZATION OF DAMAGE IN SI IRRADIATED WITH 209 MEV KR, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 122(3), 1997, pp. 559-562
Authors:
BAR E
LORENZ J
RYSSEL H
Citation: E. Bar et al., 3D SIMULATION OF SPUTTER-DEPOSITION OF TITANIUM LAYERS IN CONTACT HOLES WITH HIGH ASPECT RATIOS, Microelectronic engineering, 37-8(1-4), 1997, pp. 389-395
Authors:
KASKO I
KAL S
RYSSEL H
Citation: I. Kasko et al., CHARACTERIZATION OF THIN TISI2 FILMS BY SPECTROSCOPIC ELLIPSOMETRY AND THERMAL-WAVE ANALYSIS, Microelectronic engineering, 37-8(1-4), 1997, pp. 455-460
Authors:
BAR E
LORENZ J
RYSSEL H
Citation: E. Bar et al., 3D SIMULATION FOR SUBMICRON METALLIZATION, Microelectronic engineering, 33(1-4), 1997, pp. 397-405
Authors:
BAUER AJ
BURTE EP
RYSSEL H
Citation: Aj. Bauer et al., CHARACTERIZATION OF ULTRATHIN ON STACKED LAYERS CONSISTING OF THERMALLY GROWN BOTTOM OXIDE AND DEPOSITED SILICON-NITRIDE, Solid-state electronics, 41(7), 1997, pp. 1057-1065