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Results: 1-25 | 26-32 |
Results: 26-32/32
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices
Authors: Bruenger, WH Torkler, M Weiss, M Loschner, H Leung, K Lee, Y Hudek, P Rangelow, IW Stangl, G Fallmann, W
Citation: Wh. Bruenger et al., Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices, J VAC SCI B, 17(6), 1999, pp. 3119-3121
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Authors: Hudek, P Hrkut, P Drzik, M Kostic, I Belov, M Torres, J Wasson, J Wolfe, JC Degen, A Rangelow, IW Voigt, J Butschke, J Letzkus, F Springer, R Ehrmann, A Kaesmaier, R Kragler, K Mathuni, J Haugeneder, E Loschner, H
Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131
A design and fabrication of a 3D force sensitive microprobe for surface characterization.
Authors: Grabiec, PB Sunyk, R Shi, F Popovic, G Gotszalk, T Hudek, P Dumania, P Rangelow, IW
Citation: Pb. Grabiec et al., A design and fabrication of a 3D force sensitive microprobe for surface characterization., MICROEL ENG, 46(1-4), 1999, pp. 405-408
Resolution improvement of ion projector with a low energy spread multicuspion source
Authors: Bruenger, WH Torkler, M Leung, KN Lee, Y Williams, MD Loeschner, H Stengl, G Fallmann, W Paschke, F Stangl, G Rangelow, IW Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480
Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness
Authors: Rangelow, IW Shi, F Hudek, P Grabiec, P Volland, B Givargizov, EI Stepanova, AN Obolenskaya, LN Mashkova, ES Molchanov, VA
Citation: Iw. Rangelow et al., Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness, J VAC SCI B, 16(6), 1998, pp. 3185-3191
p-n junction-based wafer flow process for stencil mask fabrication
Authors: Rangelow, IW Shi, F Volland, B Sossna, E Petrashenko, A Hudek, P Sunyk, R Butschke, J Letzkus, F Springer, R Ehrmann, A Gross, G Kaesmaier, R Oelmann, A Struck, T Unger, G Chalupka, A Haugeneder, E Lammer, G Loschner, H Tejeda, R Lovell, E Engelstad, R
Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598
Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy
Authors: Gotszalk, T Radojewski, J Grabiec, PB Dumania, P Shi, F Hudek, P Rangelow, IW
Citation: T. Gotszalk et al., Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy, J VAC SCI B, 16(6), 1998, pp. 3948-3953
Risultati: 1-25 | 26-32 |