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Authors:
Spitzmuller, J
Fehrenbacher, M
Rauscher, H
Behm, RJ
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Authors:
Lin, JL
Petrovykh, DY
Kirakosian, A
Rauscher, H
Himpsel, FJ
Dowben, PA
Citation: Jl. Lin et al., Self-assembled Fe nanowires using organometallic chemical vapor depositionand CaF2 masks on stepped Si(111), APPL PHYS L, 78(6), 2001, pp. 829-831
Authors:
Lin, JL
Rauscher, H
Kirakosian, A
Himpsel, FJ
Dowben, PA
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Authors:
Rauscher, H
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Lin, JL
Kirakosian, A
Himpsel, FJ
Rohr, U
Mullen, K
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