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Results: 1-9 |
Results: 9
Polymers for microlithographic applications: New directions and challenges
Authors: Reichmanis, E Nalamasu, O Houlihan, FM
Citation: E. Reichmanis et al., Polymers for microlithographic applications: New directions and challenges, MACRO SYMP, 175, 2001, pp. 185-196
Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins
Authors: Houlihan, FM Dabbagh, G Rushkin, I Hutton, R Bolan, K Reichmanis, E Nalamasu, O Yan, Z Reiser, A
Citation: Fm. Houlihan et al., Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins, RADIAT PH C, 62(1), 2001, pp. 69-76
Molecular templating of nanoporous ultralow dielectric constant (approximate to 1.5) organosilicates by tailoring the microphase separation of triblock copolymers
Authors: Yang, S Mirau, PA Pai, CS Nalamasu, O Reichmanis, E Lin, EK Lee, HJ Gidley, DW Sun, JN
Citation: S. Yang et al., Molecular templating of nanoporous ultralow dielectric constant (approximate to 1.5) organosilicates by tailoring the microphase separation of triblock copolymers, CHEM MATER, 13(9), 2001, pp. 2762
Statement on education - Planning together today to meet tomorrow's challenges
Authors: Reichmanis, E
Citation: E. Reichmanis, Statement on education - Planning together today to meet tomorrow's challenges, J CHEM EDUC, 78(9), 2001, pp. 1161-1161
Fundamental studies of molecular interactions and dissolution inhibition in poly(norbornene-alt-maleic anhydride)-based resins
Authors: Houlihan, FM Dabbagh, G Rushkin, I Hutton, R Osei, D Sousa, J Bolan, K Nalamasu, O Reichmanis, E
Citation: Fm. Houlihan et al., Fundamental studies of molecular interactions and dissolution inhibition in poly(norbornene-alt-maleic anhydride)-based resins, CHEM MATER, 12(11), 2000, pp. 3516-3524
Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography
Authors: Reichmanis, E Nalamasu, O Houlihan, FM Novembre, AE
Citation: E. Reichmanis et al., Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography, POLYM INT, 48(10), 1999, pp. 1053-1059
Single-layer resist design for 193nm lithography
Authors: Nalamasu, O Houlihan, FM Cirelli, RA Watson, GP Reichmanis, E
Citation: O. Nalamasu et al., Single-layer resist design for 193nm lithography, SOL ST TECH, 42(5), 1999, pp. 29
Organic materials challenges for 193 nm imaging
Authors: Reichmanis, E Nalamasu, O Houlihan, FM
Citation: E. Reichmanis et al., Organic materials challenges for 193 nm imaging, ACC CHEM RE, 32(8), 1999, pp. 659-667
193 nm single layer resist strategies, concepts, and recent results
Authors: Nalamasu, O Houlihan, FM Cirelli, RA Timko, AG Watson, GP Hutton, RS Kometani, JM Reichmanis, E Gabor, A Medina, A Slater, S
Citation: O. Nalamasu et al., 193 nm single layer resist strategies, concepts, and recent results, J VAC SCI B, 16(6), 1998, pp. 3716-3721
Risultati: 1-9 |