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Guillet, D
Sarret, M
Haji, L
Rogel, R
Bonnaud, O
Citation: D. Guillet et al., Crystallization of amorphous silicon-germanium films deposited by low pressure chemical vapor deposition, J NON-CRYST, 266, 2000, pp. 689-693
Authors:
Rogel, R
Sarret, M
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Bonnaud, O
Kleider, JP
Citation: R. Rogel et al., High quality unhydrogenated low-pressure chemical vapor deposited polycrystalline silicon, J NON-CRYST, 266, 2000, pp. 141-145
Authors:
Pichon, L
Mercha, A
Carin, R
Bonnaud, O
Mohammed-Brahim, T
Helen, Y
Rogel, R
Citation: L. Pichon et al., Analysis of the activation energy of the subthreshold current in laser- and solid-phase-crystallized polycrystalline silicon thin-film transistors, APPL PHYS L, 77(4), 2000, pp. 576-578