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Results:
1-14
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Results: 14
Authors:
FARHOUD M
HWANG M
SMITH HI
SCHATTENBURG ML
BAE JM
YOUCEFTOUMI K
ROSS CA
Citation: M. Farhoud et al., FABRICATION OF LARGE-AREA NANOSTRUCTURED MAGNETS BY INTERFEROMETRIC LITHOGRAPHY, IEEE transactions on magnetics, 34(4), 1998, pp. 1087-1089
Authors:
BALKEY MM
SCIME EE
SCHATTENBURG ML
VANBEEK J
Citation: Mm. Balkey et al., EFFECTS OF GAP WIDTH ON VACUUM-ULTRAVIOLET TRANSMISSION THROUGH SUBMICROMETER-PERIOD, FREESTANDING TRANSMISSION GRATINGS, Applied optics, 37(22), 1998, pp. 5087-5092
Authors:
FRANKE AE
SCHATTENBURG ML
GULLIKSON EM
COTTAM J
KAHN SM
RASMUSSEN A
Citation: Ae. Franke et al., SUPER-SMOOTH X-RAY REFLECTION GRATING FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2940-2945
Authors:
GOODBERLET J
SILVERMAN S
FERRERA J
MONDOL M
SCHATTENBURG ML
SMITH HI
Citation: J. Goodberlet et al., A ONE-DIMENSIONAL DEMONSTRATION OF SPATIAL-PHASE-LOCKED ELECTRON-BEAMLITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 473-476
Authors:
FERRERA J
SCHATTENBURG ML
SMITH HI
Citation: J. Ferrera et al., ANALYSIS OF DISTORTION IN INTERFEROMETRIC LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4009-4013
Authors:
SAVAS TA
SCHATTENBURG ML
CARTER JM
SMITH HI
Citation: Ta. Savas et al., LARGE-AREA ACHROMATIC INTERFEROMETRIC LITHOGRAPHY FOR 100 NM PERIOD GRATINGS AND GRIDS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4167-4170
Authors:
SMITH HI
SCHATTENBURG ML
HECTOR SD
FERRERA J
MOON EE
YANG IY
BURKHARDT M
Citation: Hi. Smith et al., X-RAY NANOLITHOGRAPHY - EXTENSION TO THE LIMITS OF THE LITHOGRAPHIC PROCESS, Microelectronic engineering, 32(1-4), 1996, pp. 143-158
Authors:
SAVAS TA
SHAH SN
SCHATTENBURG ML
CARTER JM
SMITH HI
Citation: Ta. Savas et al., ACHROMATIC INTERFEROMETRIC LITHOGRAPHY FOR 100-NM-PERIOD GRATINGS ANDGRIDS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2732-2735
Authors:
SCHATTENBURG ML
AUCOIN RJ
FLEMING RC
Citation: Ml. Schattenburg et al., OPTICALLY MATCHED TRILEVEL RESIST PROCESS FOR NANOSTRUCTURE FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3007-3011
Authors:
SCIME EE
ANDERSON EH
MCCOMAS DJ
SCHATTENBURG ML
Citation: Ee. Scime et al., EXTREME-ULTRAVIOLET POLARIZATION AND FILTERING WITH GOLD TRANSMISSIONGRATINGS, Applied optics, 34(4), 1995, pp. 648-654
Authors:
HECTOR SD
SMITH HI
GUPTA N
SCHATTENBURG ML
Citation: Sd. Hector et al., OPTIMIZING SYNCHROTRON-BASED X-RAY-LITHOGRAPHY FOR 0.1 MU-M LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 203-206
Authors:
SCHATTENBURG ML
POLCE NA
SMITH HI
STEIN R
Citation: Ml. Schattenburg et al., FABRICATION OF FLIP-BONDED MESA MASKS FOR X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2906-2909
Authors:
HECTOR SD
SMITH HI
SCHATTENBURG ML
Citation: Sd. Hector et al., SIMULTANEOUS-OPTIMIZATION OF SPECTRUM, SPATIAL COHERENCE, GAP, FEATURE BIAS, AND ABSORBER THICKNESS IN SYNCHROTRON-BASED X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2981-2985
Authors:
SMITH HI
SCHATTENBURG ML
Citation: Hi. Smith et Ml. Schattenburg, X-RAY-LITHOGRAPHY, FROM 500 TO 30 NM - X-RAY NANOLITHOGRAPHY, IBM journal of research and development, 37(3), 1993, pp. 319-329
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