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Results: 1-11 |
Results: 11
TEMPERATURE AND GROWTH-RATE EFFECTS ON THE HYDROGEN INCORPORATION IN A-SI-H
Authors: KESSELS WMM SEVERENS RJ VANDESANDEN MCV SCHRAM DC
Citation: Wmm. Kessels et al., TEMPERATURE AND GROWTH-RATE EFFECTS ON THE HYDROGEN INCORPORATION IN A-SI-H, Journal of non-crystalline solids, 230, 1998, pp. 133-137
PLASMA CHEMISTRY ASPECTS OF A-SI-H DEPOSITION USING AN EXPANDING THERMAL PLASMA
Authors: VANDESANDEN MCM SEVERENS RJ KESSELS WMM MEULENBROEKS RFG SCHRAM DC
Citation: Mcm. Vandesanden et al., PLASMA CHEMISTRY ASPECTS OF A-SI-H DEPOSITION USING AN EXPANDING THERMAL PLASMA, Journal of applied physics, 84(5), 1998, pp. 2426-2435
HIGH-QUALITY A-SI-H GROWN AT HIGH-RATE USING AN EXPANDING THERMAL PLASMA
Authors: VANDESANDEN MCM SEVERENS RJ BASTIAANSSEN J SCHRAM DC
Citation: Mcm. Vandesanden et al., HIGH-QUALITY A-SI-H GROWN AT HIGH-RATE USING AN EXPANDING THERMAL PLASMA, Surface & coatings technology, 97(1-3), 1997, pp. 719-722
CARBON NITRIDE THIN-FILMS PREPARED BY A CAPACITIVELY COUPLED RF PLASMA-JET
Authors: DINESCU G ALDEA E BOIERIU P MUSA G ANDREI A DINESCU M BRUSSAARD GJH SEVERENS RJ VANDESANDEN MCM SCHRAM DC
Citation: G. Dinescu et al., CARBON NITRIDE THIN-FILMS PREPARED BY A CAPACITIVELY COUPLED RF PLASMA-JET, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 298-302
ELECTRODELESS THIN-FILM CONDUCTANCE MEASUREMENTS USING THE SOMMER-TANNER METHOD
Authors: SEVERENS RJ VERHOEVEN HJM SCHAEPKENS M VANDESANDEN MCM SCHRAM DC
Citation: Rj. Severens et al., ELECTRODELESS THIN-FILM CONDUCTANCE MEASUREMENTS USING THE SOMMER-TANNER METHOD, Review of scientific instruments, 67(10), 1996, pp. 3624-3626
FAST DEPOSITION OF THIN AMORPHOUS FILMS USING AN EXPANDING THERMAL PLASMA
Authors: VANDESANDEN MCM GIELEN JWAM SEVERENS RJ PAFFEN RMJ SCHRAM DC
Citation: Mcm. Vandesanden et al., FAST DEPOSITION OF THIN AMORPHOUS FILMS USING AN EXPANDING THERMAL PLASMA, Pure and applied chemistry, 68(5), 1996, pp. 1155-1158
THE ROLE OF HYDROGEN DURING PLASMA BEAM DEPOSITION OF AMORPHOUS THIN-FILMS
Authors: VANDESANDEN MCM SEVERENS RJ MEULENBROEKS RFG DEGRAAF MJ QING Z OTORBAEV DK ENGELN R GIELEN JWAM VANDERMULLEN JAM SCHRAM DC
Citation: Mcm. Vandesanden et al., THE ROLE OF HYDROGEN DURING PLASMA BEAM DEPOSITION OF AMORPHOUS THIN-FILMS, Surface & coatings technology, 74-5(1-3), 1995, pp. 1-9
CLEANING OF IRON ARCHAEOLOGICAL ARTIFACTS BY CASCADED ARE PLASMA TREATMENT
Authors: DEGRAAF MJ SEVERENS RJ VANIJZENDOORN LJ MUNNIK F MEIJERS HJM KARS H VANDESANDEN MCM SCHRAM DC
Citation: Mj. Degraaf et al., CLEANING OF IRON ARCHAEOLOGICAL ARTIFACTS BY CASCADED ARE PLASMA TREATMENT, Surface & coatings technology, 74-5(1-3), 1995, pp. 351-354
CHARACTERIZATION OF PLASMA BEAM DEPOSITED AMORPHOUS HYDROGENATED SILICON
Authors: SEVERENS RJ BRUSSAARD GJH VANDESANDEN MCM SCHRAM DC
Citation: Rj. Severens et al., CHARACTERIZATION OF PLASMA BEAM DEPOSITED AMORPHOUS HYDROGENATED SILICON, Applied physics letters, 67(4), 1995, pp. 491-493
DISSOCIATIVE RECOMBINATION IN CASCADED ARC GENERATED AR-N2 AND N2 EXPANDING PLASMA
Authors: DAHIYA RP DEGRAAF MJ SEVERENS RJ SWELSEN H VANDESANDEN MCM SCHRAM DC
Citation: Rp. Dahiya et al., DISSOCIATIVE RECOMBINATION IN CASCADED ARC GENERATED AR-N2 AND N2 EXPANDING PLASMA, Physics of plasmas, 1(6), 1994, pp. 2086-2095
APPLICATIONS OF CYCLOTRON BASED ION-SCATTERING
Authors: VANIJZENDOORN LJ NIEMANTSVERDRIET JW SEVERENS RJ VANDIJK PWL DEVOIGT MJA
Citation: Lj. Vanijzendoorn et al., APPLICATIONS OF CYCLOTRON BASED ION-SCATTERING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 89(1-4), 1994, pp. 114-121
Risultati: 1-11 |