Authors: STEFANI JA POARCH S SAXENA S MOZUMDER PK

Citation: Ja. Stefani et al., ADVANCED PROCESS-CONTROL OF A CVD TUNGSTEN REACTOR, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 366-383

Authors: LOEWENSTEIN LM STEFANI JA BUTLER SW

Citation: Lm. Loewenstein et al., 1ST-WAFER EFFECT IN REMOTE PLASMA PROCESSING - THE STRIPPING OF PHOTORESIST, SILICON-NITRIDE, AND POLYSILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2810-2817

Authors: BARNA GG LOEWENSTEIN LM BRANKNER KJ BUTLER SW MOZUMDER PK STEFANI JA HENCK SA CHAPADOS P BUCK D MAUNG S SAXENA S UNRUH A

Citation: Gg. Barna et al., SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2860-2867

Authors: BUTLER SW STEFANI JA

Citation: Sw. Butler et Ja. Stefani, SUPERVISORY RUN-TO-RUN CONTROL OF POLYSILICON GATE ETCH USING IN-SITUELLIPSOMETRY, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 193-201

Authors: BARNA GG LOEWENSTEIN LM HENCK SA CHAPADOS P BRANKNER KJ GALE RJ MOZUMDER PK BUTLER SW STEFANI JA

Citation: Gg. Barna et al., DRY ETCH PROCESSES AND SENSORS, Solid state technology, 37(1), 1994, pp. 47