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Results:
1-22
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Results: 22
Authors:
STOFFELS WW
STOFFELS E
TACHIBANA K
Citation: Ww. Stoffels et al., POLYMERIZATION OF FLUOROCARBONS IN REACTIVE ION ETCHING PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 87-95
Authors:
STOFFELS E
STOFFELS WW
TACHIBANA K
Citation: E. Stoffels et al., ELECTRON-ATTACHMENT MASS-SPECTROSCOPY AS A DIAGNOSTICS FOR ELECTRONEGATIVE GASES AND PLASMAS, Review of scientific instruments, 69(1), 1998, pp. 116-122
Authors:
SWINKELS GHPM
STOFFELS E
STOFFELS WW
SIMONS N
KROESEN GMW
DEHOOG FJ
Citation: Ghpm. Swinkels et al., TREATMENT OF DUST PARTICLES IN AN RF PLASMA MONITORED BY MIE SCATTERING ROTATING COMPENSATOR ELLIPSOMETRY, Pure and applied chemistry, 70(6), 1998, pp. 1151-1156
Authors:
STOFFELS E
STOFFELS WW
TACHIBANA K
IMAI S
Citation: E. Stoffels et al., ANGLE-RESOLVED MASS-SPECTROMETRY OF POSITIVE-IONS TRANSMITTED THROUGHHIGH-ASPECT-RATIO CHANNELS IN A RADIO-FREQUENCY DISCHARGE, JPN J A P 1, 36(7B), 1997, pp. 4632-4637
Authors:
STOFFELS WW
STOFFELS E
TACHIBANA K
Citation: Ww. Stoffels et al., ELECTRON-ATTACHMENT MASS-SPECTROMETRY FOR THE DETECTION OF ELECTRONEGATIVE SPECIES IN A PLASMA, JPN J A P 1, 36(7B), 1997, pp. 4638-4643
Authors:
SHIRAFUJI T
STOFFELS WW
MORIGUCHI H
TACHIBANA K
Citation: T. Shirafuji et al., SILICON SURFACES TREATED BY CF4, CF4 H-2, AND CF4/O-2 RF PLASMAS - STUDY BY IN-SITU FOURIER-TRANSFORM INFRARED ELLIPSOMETRY/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(2), 1997, pp. 209-215
Authors:
HAVERLAG M
STOFFELS E
STOFFELS WW
KROESEN GMW
DEHOOG FJ
Citation: M. Haverlag et al., MEASUREMENT OF THE GAS TEMPERATURE IN FLUOROCARBON RADIO-FREQUENCY DISCHARGES USING INFRARED-ABSORPTION SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 380-383
Authors:
HAVERLAG M
STOFFELS WW
STOFFELS E
KROESEN GMW
DEHOOG FJ
Citation: M. Haverlag et al., PRODUCTION AND DESTRUCTION OF CFX RADICALS IN RADIOFREQUENCY FLUOROCARBON PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 384-390
Authors:
STOFFELS E
STOFFELS WW
KROESEN GMW
DEHOOG FJ
Citation: E. Stoffels et al., DUST FORMATION AND CHARGING IN AN AR SIH4 RADIOFREQUENCY DISCHARGE/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 556-561
Authors:
STOFFELS WW
STOFFELS E
KROESEN GMW
DEHOOG FJ
Citation: Ww. Stoffels et al., DETECTION OF DUST PARTICLES IN THE PLASMA BY LASER-INDUCED HEATING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 588-594
Authors:
BOUCHOULE A
BOUFENDI L
HERMANN J
PLAIN A
HBID T
KROESEN G
STOFFELS E
STOFFELS WW
Citation: A. Bouchoule et al., FORMATION OF DENSE SUBMICRONIC CLOUDS IN LOW-PRESSURE AR-SIH4 RF REACTOR - DIAGNOSTICS AND GROWTH-PROCESSES FROM MONOMERS TO LARGE-SIZE PARTICULATES, Pure and applied chemistry, 68(5), 1996, pp. 1121-1126
Authors:
STOFFELS E
STOFFELS WW
VENDER D
KANDO M
KROESEN GMW
DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN A RADIOFREQUENCY OXYGEN PLASMA, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(3), 1995, pp. 2425-2435
Authors:
VENDER D
STOFFELS WW
STOFFELS E
KROESEN GMW
DEHOOG FJ
Citation: D. Vender et al., CHARGED-SPECIES PROFILES IN ELECTRONEGATIVE RADIOFREQUENCY PLASMAS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(3), 1995, pp. 2436-2444
Authors:
HAVERLAG M
STOFFELS WW
STOFFELS E
DENBOER JHWG
KROESEN GMW
DEHOOG FJ
Citation: M. Haverlag et al., HIGH-RESOLUTION INFRARED-SPECTROSCOPY OF ETCHING PLASMAS, Plasma sources science & technology, 4(2), 1995, pp. 260-267
Authors:
STOFFELS E
STOFFELS WW
VENDER D
HAVERLAG M
KROESEN GMW
DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN LOW-PRESSURE DISCHARGES, Contributions to Plasma Physics, 35(4-5), 1995, pp. 331-357
Authors:
STOFFELS E
STOFFELS WW
VENDER D
KROESEN GMW
DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN A CCL2F2 RADIO-FREQUENCY DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2051-2057
Authors:
STOFFELS WW
STOFFELS E
HAVERLAG M
KROESEN GMW
DEHOOG FJ
Citation: Ww. Stoffels et al., THE CHEMISTRY OF A CCL2F2 RADIO-FREQUENCY DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2058-2066
Authors:
STOFFELS WW
STOFFELS E
KROESEN GMW
DEHOOG FJ
Citation: Ww. Stoffels et al., ELECTRON-DENSITY FLUCTUATIONS IN A DUSTY AR SIH4 RF DISCHARGE/, Journal of applied physics, 78(8), 1995, pp. 4867-4872
Authors:
HAVERLAG M
STOFFELS E
STOFFELS WW
KROESEN GMW
DEHOOG FJ
Citation: M. Haverlag et al., MEASUREMENTS OF RADICAL DENSITIES IN RADIOFREQUENCY FLUOROCARBON PLASMAS USING INFRARED-ABSORPTION SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3102-3108
Authors:
STOFFELS E
STOFFELS WW
VENDER D
KROESEN GMW
DEHOOG FJ
Citation: E. Stoffels et al., LASER-PARTICULATE INTERACTIONS IN A DUSTY RF PLASMA, IEEE transactions on plasma science, 22(2), 1994, pp. 116-121
Authors:
BOUFENDI L
HERMANN J
BOUCHOULE A
DUBREUIL B
STOFFELS E
STOFFELS WW
DEGIORGI ML
Citation: L. Boufendi et al., STUDY OF INITIAL DUST FORMATION IN AN AR-SIH4 DISCHARGE BY LASER-INDUCED PARTICLE EXPLOSIVE EVAPORATION, Journal of applied physics, 76(1), 1994, pp. 148-153
Authors:
STOFFELS WW
STOFFELS E
KROESEN GMW
DEHOOG FJ
Citation: Ww. Stoffels et al., DETECTION OF PARTICULATES IN A RF PLASMA BY LASER EVAPORATION AND SUBSEQUENT DISCHARGE FORMATION, Journal of applied physics, 74(4), 1993, pp. 2959-2961
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