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Citation: T. Hosomi et al., ROLE OF XENON ADDITIVE IN MICROWAVE PLASMA-ASSISTED (H-2-VAPOR-DEPOSITION OF DIAMOND THIN-FILM(CH4) CHEMICAL), Journal of applied physics, 84(11), 1998, pp. 6059-6063

Authors: MIYAKE H SUGAHARA K KOBAYASHI T KONDO K TANIGUCHI M SUGIYO M

Citation: H. Miyake et al., EFFECT OF OXYGEN ADDITIVE ON MICROWAVE PLASMA FOR DIAMOND FILM SYNTHESIS STUDIED BY THE PLASMA IMPEDANCE MEASUREMENT, JPN J A P 2, 35(7B), 1996, pp. 933-936

Authors: ISHII A AMADATSU S MINOMO S TANIGUCHI M SUGIYO M

Citation: A. Ishii et al., CHARACTERIZATION OF DIAMOND-LIKE CARBON-FILMS GROWN BY SUPER-WIDE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1068-1071

Authors: ISHII A AMADATSU S MINOMO S TANIGUCHI M SUGIYO M SAKAGUCHI Y KOBAYASHI T

Citation: A. Ishii et al., SUPER-WIDE ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE EXCITED BY TRAVELING MICROWAVE AS AN EFFICIENT TOOL FOR DIAMOND-LIKE CARBON-FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1241-1243

Authors: ISHII A SAKAGUCHI Y MINOMO S TANIGUCHI M SUGIYO M KOBAYASHI T

Citation: A. Ishii et al., DIAMOND-LIKE CARBON-FILM DEPOSITION BY SUPER-WIDE ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE EXCITED BY TRAVELING MICROWAVE, JPN J A P 2, 32(6A), 1993, pp. 802-805