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Results: 1-10 |
Results: 10
Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films I. Experimental study and proposal of new kinetic laws
Authors: Barathieu, P Caussat, B Scheid, E Jaume, D Couderc, JP
Citation: P. Barathieu et al., Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films I. Experimental study and proposal of new kinetic laws, J ELCHEM SO, 148(3), 2001, pp. C149-C155
Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films II. Theoretical local analysis of the process
Authors: Barathieu, P Caussat, B Scheid, E Couderc, JP
Citation: P. Barathieu et al., Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films II. Theoretical local analysis of the process, J ELCHEM SO, 148(3), 2001, pp. C156-C161
Design of a low power SnO2 gas sensor integrated on silicon oxynitride membrane
Authors: Astie, S Gue, AM Scheid, E Guillemet, JP
Citation: S. Astie et al., Design of a low power SnO2 gas sensor integrated on silicon oxynitride membrane, SENS ACTU-B, 67(1-2), 2000, pp. 84-88
Boron doped polysilicon deposition in a sector reactor: Specific phenomenaand properties
Authors: Scheid, E Furgal, L Vergnes, H
Citation: E. Scheid et al., Boron doped polysilicon deposition in a sector reactor: Specific phenomenaand properties, J PHYS IV, 9(P8), 1999, pp. 885-892
Chemical vapor deposition of semi-insulating polycrystalline silicon (SIPOS): Experience and simulation
Authors: Barathieu, P Caussat, B Scheid, E Jaume, D Couderc, JP
Citation: P. Barathieu et al., Chemical vapor deposition of semi-insulating polycrystalline silicon (SIPOS): Experience and simulation, J PHYS IV, 9(P8), 1999, pp. 173-180
Energy study of buckled micromachined beams for thin-film stress measurements applied to SiO2
Authors: Nicu, L Temple-Boyer, P Bergaud, C Scheid, E Martinez, A
Citation: L. Nicu et al., Energy study of buckled micromachined beams for thin-film stress measurements applied to SiO2, J MICROM M, 9(4), 1999, pp. 414-421
Improved characterization of polycrystalline silicon film, by resonant Raman scattering
Authors: Paillard, V Puech, P Temple-Boyer, P Caussat, B Scheid, E Couderc, JP de Mauduit, B
Citation: V. Paillard et al., Improved characterization of polycrystalline silicon film, by resonant Raman scattering, THIN SOL FI, 337(1-2), 1999, pp. 93-97
Breakdown properties of metal NIDOS SiO2/silicon structures
Authors: Temple-Boyer, P Olivie, F Scheid, E Sarrabayrouse, G Alay, JL Morante, JR
Citation: P. Temple-boyer et al., Breakdown properties of metal NIDOS SiO2/silicon structures, MICROEL REL, 39(2), 1999, pp. 187-190
Analysis and modeling of low pressure CVD of silicon nitride from a silane-ammonia mixture - I. Experimental study and determination of a gaseous phase mechanism
Authors: Yacoubi, K Azzaro-Pantel, C Scheid, E Couderc, JP
Citation: K. Yacoubi et al., Analysis and modeling of low pressure CVD of silicon nitride from a silane-ammonia mixture - I. Experimental study and determination of a gaseous phase mechanism, J ELCHEM SO, 146(8), 1999, pp. 3009-3017
Influence of substrate nature on the microstructure of LPCVD silicon films
Authors: Caussat, B Couderc, JP Scheid, E Bourgerette, C de Mauduit, B
Citation: B. Caussat et al., Influence of substrate nature on the microstructure of LPCVD silicon films, J MAT SCI L, 17(22), 1998, pp. 1899-1901
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