ACNP - Italian Periodicals Catalogue

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Results: 1-10 |

Results: 10

Atomic layer deposition of thin films using O-2 as oxygen source

Authors: Schuisky, M Aarik, J Kukli, K Aidla, A Harsta, A

Citation: M. Schuisky et al., Atomic layer deposition of thin films using O-2 as oxygen source, LANGMUIR, 17(18), 2001, pp. 5508-5512

Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

Authors: Aarik, J Aidla, A Mandar, H Uustare, T Kukli, K Schuisky, M

Citation: J. Aarik et al., Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures, APPL SURF S, 173(1-2), 2001, pp. 15-21

Atomic layer deposition of titanium oxide from TiI4 and H2O2

Authors: Kukli, K Ritala, M Schuisky, M Leskela, M Sajavaara, T Keinonen, J Uustare, T Harsta, A

Citation: K. Kukli et al., Atomic layer deposition of titanium oxide from TiI4 and H2O2, CHEM VAPOR, 6(6), 2000, pp. 303-310

Epitaxial growth of Bi4Ti3O12 on alpha-Al2O3(012) substrates by CVD using metal chloride precursors

Authors: Schuisky, M Skoog, R Harsta, A

Citation: M. Schuisky et al., Epitaxial growth of Bi4Ti3O12 on alpha-Al2O3(012) substrates by CVD using metal chloride precursors, CHEM VAPOR, 6(4), 2000, pp. 177-180

Atomic layer CVD in the Bi-Ti-O system

Authors: Schuisky, M Kukli, K Ritala, M Harsta, A Leskela, M

Citation: M. Schuisky et al., Atomic layer CVD in the Bi-Ti-O system, CHEM VAPOR, 6(3), 2000, pp. 139-145

Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2

Authors: Kukli, K Aidla, A Aarik, J Schuisky, M Harsta, A Ritala, M Leskela, M

Citation: K. Kukli et al., Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2, LANGMUIR, 16(21), 2000, pp. 8122-8128

Ferroelectric Bi4Ti3O12 thin films on Pt-coated silicon by halide chemicalvapor deposition

Authors: Schuisky, M Harsta, A Khartsev, S Grishin, A

Citation: M. Schuisky et al., Ferroelectric Bi4Ti3O12 thin films on Pt-coated silicon by halide chemicalvapor deposition, J APPL PHYS, 88(5), 2000, pp. 2819-2824

Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase

Authors: Schuisky, M Harsta, A Aidla, A Kukli, K Kiisler, AA Aarik, J

Citation: M. Schuisky et al., Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase, J ELCHEM SO, 147(9), 2000, pp. 3319-3325

Epitaxial growth of TiO2 (rutile) thin films by halide CVD

Authors: Schuisky, M Harsta, A

Citation: M. Schuisky et A. Harsta, Epitaxial growth of TiO2 (rutile) thin films by halide CVD, J PHYS IV, 9(P8), 1999, pp. 381-386

Halide chemical vapor deposition of Bi4Ti3O12

Authors: Schuisky, M Harsta, A

Citation: M. Schuisky et A. Harsta, Halide chemical vapor deposition of Bi4Ti3O12, CHEM VAPOR, 4(6), 1998, pp. 213

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