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Results:
1-8
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Results: 8
Authors:
Watanabe, Y
Shiratani, M
Koga, K
Citation: Y. Watanabe et al., Formation kinetics and control of dust particles in capacitively-coupled reactive plasmas, PHYS SCR, T89, 2001, pp. 29-32
Authors:
Shiratani, M
Maeda, S
Koga, K
Watanabe, Y
Citation: M. Shiratani et al., Effects of gas temperature gradient, pulse discharge modulation, and hydrogen dilution on particle growth in silane RF discharges, JPN J A P 1, 39(1), 2000, pp. 287-293
Authors:
Koga, K
Matsuoka, Y
Tanaka, K
Shiratani, M
Watanabe, Y
Citation: K. Koga et al., In situ observation of nucleation and subsequent growth of clusters in silane radio frequency discharges, APPL PHYS L, 77(2), 2000, pp. 196-198
Authors:
Jin, HJ
Shiratani, M
Nakatake, Y
Fukuzawa, T
Kinoshita, T
Watanabe, Y
Toyofuku, M
Citation: Hj. Jin et al., Conformal deposition of high-purity copper using plasma reactor with H atom source, JPN J A P 1, 38(7B), 1999, pp. 4492-4495
Authors:
Shiratani, M
Fukuzawa, T
Watanabe, Y
Citation: M. Shiratani et al., Particle growth kinetics in silane RF discharges, JPN J A P 1, 38(7B), 1999, pp. 4542-4549
Authors:
Matsuoka, Y
Shiratani, M
Fukuzawa, T
Watanabe, Y
Kim, KS
Citation: Y. Matsuoka et al., Effects of gas flow on particle growth in silane RF discharges, JPN J A P 1, 38(7B), 1999, pp. 4556-4560
Authors:
Jin, HJ
Shiratani, M
Kawasaki, T
Fukuzawa, T
Kinoshita, T
Watanabe, Y
Kawasaki, H
Toyofuku, M
Citation: Hj. Jin et al., Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom source, J VAC SCI A, 17(3), 1999, pp. 726-730
Authors:
Fukuzawa, T
Kushima, S
Matsuoka, Y
Shiratani, M
Watanabe, Y
Citation: T. Fukuzawa et al., Growth of particles in cluster-size range in low pressure and low power SiH4 rf discharges, J APPL PHYS, 86(7), 1999, pp. 3543-3549
Risultati:
1-8
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