Authors: Fabreguette, F Maglione, M Imhoff, L Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M

Citation: F. Fabreguette et al., Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiNxOy films as a function of the growth temperature: a percolation approach, APPL SURF S, 175, 2001, pp. 574-578

Authors: Fabreguette, F Imhoff, L Heintz, O Maglione, M Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M

Citation: F. Fabreguette et al., Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth, APPL SURF S, 175, 2001, pp. 685-690

Authors: Dazzi, A Gueldry, A Maglione, M Sibillot, P Mathey, P Jullien, P

Citation: A. Dazzi et al., Selective growth and optical properties of sputtered BaTiO3 films, EPJ-APPL PH, 9(3), 2000, pp. 181-185

Authors: Fabreguette, F Imhoff, L Maglione, M Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M

Citation: F. Fabreguette et al., Correlation between the electrical properties and morphology of low-pressure MOCVD titanium oxynitride thin films grown at various temperatures, CHEM VAPOR, 6(3), 2000, pp. 109-114

Authors: Fabreguette, F Imhoff, L Guillot, J Domenichini, B de Lucas, MC Sibillot, P Bourgeois, S Sacilotti, M

Citation: F. Fabreguette et al., Temperature and substrate influence on the structure of TiNxOy thin films grown by low pressure metal organic chemical vapour deposition, SURF COAT, 125(1-3), 2000, pp. 396-399

Authors: Gauthier, V Bourgeois, S Sibillot, P Maglione, M Sacilotti, M

Citation: V. Gauthier et al., Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films, THIN SOL FI, 340(1-2), 1999, pp. 175-182