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Authors:
Heller, ER
Jones, DE
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Silverman, PJ
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Sorsch, TW
Timp, GL
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Weir, BE
Silverman, PJ
Moccio, SV
Kim, YO
Citation: Ml. Green et al., Understanding the limits of ultrathin SiO2 and Si-O-N gate dielectrics forsub50 nm CMOS, MICROEL ENG, 48(1-4), 1999, pp. 25-30
Authors:
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Hash, GL
Schanwald, LP
Loemker, RA
Krisch, KS
Green, ML
Weir, BE
Silverman, PJ
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