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Results:
1-13
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Results: 13
Authors:
Raether, F
Springer, R
Beyer, S
Citation: F. Raether et al., Optical dilatometry for the control of microstructure development during sintering, MAT RES INN, 4(4), 2001, pp. 245-250
Authors:
Springer, R
Citation: R. Springer, The law of rock, REV FR ETUD, (87), 2001, pp. 125-126
Authors:
Letzkus, F
Butschke, J
Irmscher, M
Reuter, C
Springer, R
Eder, S
Loschner, H
Eberhardt, R
Mohaupt, M
Ehrmann, A
Mathuni, J
Panzer, B
Struck, T
Citation: F. Letzkus et al., Reference plate manufacturing process for the ion projection lithography pattern lock system, MICROEL ENG, 57-8, 2001, pp. 213-218
Authors:
Raether, F
Springer, R
Citation: F. Raether et R. Springer, In-situ measurement of neck formation during sintering of alumina by a novel thermooptical measuring device, ADV ENG MAT, 2(11), 2000, pp. 741-744
Authors:
Letzkus, F
Butschke, J
Hofflinger, B
Irmscher, M
Reuter, C
Springer, R
Ehrmann, A
Mathuni, J
Citation: F. Letzkus et al., Dry etch improvements in the SOI Wafer Flow Process for IPL stencil mask fabrication, MICROEL ENG, 53(1-4), 2000, pp. 609-612
Authors:
Ehrmann, A
Struck, T
Chalupka, A
Haugeneder, E
Loschner, H
Butschke, J
Irmscher, M
Letzkus, F
Springer, R
Degen, A
Rangelow, IW
Shi, F
Sossna, E
Volland, B
Engelstad, R
Lovell, E
Tejeda, R
Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111
Authors:
Elian, K
Irmscher, M
Butschke, J
Letzkus, F
Reuter, C
Springer, R
Citation: K. Elian et al., Comparative evaluation of electron-beam sensitive single layer top surfaceimaging and bilayer chemical amplification of resist lines process for stencil mask making, J VAC SCI B, 17(6), 1999, pp. 3122-3126
Authors:
Hudek, P
Hrkut, P
Drzik, M
Kostic, I
Belov, M
Torres, J
Wasson, J
Wolfe, JC
Degen, A
Rangelow, IW
Voigt, J
Butschke, J
Letzkus, F
Springer, R
Ehrmann, A
Kaesmaier, R
Kragler, K
Mathuni, J
Haugeneder, E
Loschner, H
Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131
Authors:
Springer, R
Citation: R. Springer, Three works on jazz in America, REV FR ETUD, (82), 1999, pp. 125-127
Authors:
Butschke, J
Ehrmann, A
Hofflinger, B
Irmscher, M
Kasmaier, R
Letzkus, F
Loschner, H
Mathuni, J
Reuter, C
Schomburg, C
Springer, R
Citation: J. Butschke et al., SOI wafer flow process for stencil mask fabrication, MICROEL ENG, 46(1-4), 1999, pp. 473-476
Authors:
Springer, R
Citation: R. Springer, The end of new production concepts? Rationalization and labour policy in the German auto industry, ECON IND D, 20(1), 1999, pp. 117-145
Authors:
Becker, H
Springer, R
Citation: H. Becker et R. Springer, Prevention of capsular contracture, PLAS R SURG, 103(6), 1999, pp. 1766-1768
Authors:
Rangelow, IW
Shi, F
Volland, B
Sossna, E
Petrashenko, A
Hudek, P
Sunyk, R
Butschke, J
Letzkus, F
Springer, R
Ehrmann, A
Gross, G
Kaesmaier, R
Oelmann, A
Struck, T
Unger, G
Chalupka, A
Haugeneder, E
Lammer, G
Loschner, H
Tejeda, R
Lovell, E
Engelstad, R
Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598
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