Authors: Masuda, T Miyaguchi, Y Tanimura, M Nishioka, Y Suu, K Tani, N

Citation: T. Masuda et al., Development of PZT sputtering method for mass-production, APPL SURF S, 169, 2001, pp. 539-543

Authors: Masuda, T Miyaguchi, Y Suu, K Sun, S

Citation: T. Masuda et al., Preparation of SrBi2Ta1.5Nb0.5O9 ferroelectric thin films by RF sputteringon large substrate, JPN J A P 1, 39(9B), 2000, pp. 5460-5464

Authors: Masuda, T Miyaguchi, W Suu, K Sun, S

Citation: T. Masuda et al., Preparation of SrBi2(Ta, Nb)(2)O-9 thin films by RF sputtering for ferroelectric memory production, INTEGR FERR, 31(1-4), 2000, pp. 23-33

Authors: Suu, K Tani, N Chu, F Hickert, G Hadnagy, TD Davenport, T

Citation: K. Suu et al., Process stability of ferroelectric PLZT thin film sputtering for FRAM (R) production, INTEGR FERR, 26(1-4), 1999, pp. 711-721